Used KOKUSAI Quixace DJ-1206V #9093994 for sale

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KOKUSAI Quixace DJ-1206V
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ID: 9093994
Wafer Size: 12"
Diffusion furnaces, 12".
KOKUSAI Quixace DJ-1206V is a diffusion furnace and accessory designed for high-quality and efficient diffusion of metals. It has advanced high temperature control technology and is capable of performing high temperature diffusion annealing of a wide range of metals including copper and nickel alloys with repeatable high yields of accuracy and results. Quixace DJ-1206V is a large scale, multi-purpose diffusion furnace designed to provide uniformly high-temperature heat to the substrate material. The advanced temperature control features of KOKUSAI Quixace DJ-1206V are capable of performing high temperature diffusion annealing of a wide range of metals with repeatable high yields of accuracy and results. Quixace DJ-1206V utilizes a high-performance ceramic heater structure which can be adjusted up to upwards of 800 degrees Celsius at a rate of 5 degrees Celsius per hour. The integrated laser interferometer ensures accurate temperature uniformity across the heating zone, as well as precise temperature control even at very high temperatures. The diffusion furnace is outfitted with a range of accessories to help maximize its utility. This includes a gas feed line which can be used to control the oxygen concentration in the annealing environment. There is also a cold trap attachment which can be used to maintain a low temperature in the annealing chamber in order to enhance filtration accuracy and uniformity. The optional integrated powder thermal sensor facilitates ultra-precise temperature control during thin film deposition processes. When this attachment is used together with the integrated laser interferometer, temperature uniformity and accuracy can be achieved to a very high degree across the entire sample surface. Lastly, KOKUSAI Quixace DJ-1206V has an advanced humidity control system which can precisely measure and control the humidity levels for optimal process conditions. The diffusion furnace can thus be used for a variety of applications such as silicon growth, crystal doping, interfacial engineering, and a wide range of annealing techniques. Overall, Quixace DJ-1206V is a versatile and high-performance diffusion furnace and accessory, designed to provide high efficiency and superior results for a variety of annealing applications. With its advanced temperature control features, integrated laser interferometer, gas feed line, cold trap attachment, powder thermal sensor and humidity control system, it is the perfect choice for achieving high yields of uniform and accurate results.
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