Used KOKUSAI Vertron III #135994 for sale

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ID: 135994
Wafer Size: 8"
Vintage: 1999
Vertical diffusion furnace / LPCVD / Poly CVD furnace, 8" Process applications: Dry-Ox, Wet-Ox, NO(N2O)-Anneal, Well Diffusion, N2(Ar, H2)-Anneal, PH3-Anneal, Doped/Undoped-Poly-Si, Doped/Undoped-SiGe-Poly, Si3N4, TEOS, HTO Accommodates: 5 wafers simultaneously Automatic filler dummy wafer supply by wafer detection mechanism SEMI standard compliant I/O stage Supports SMIF interface GUI tube controller (CX3000 series) SECS / GEM compatibility 1999 vintage.
KOKUSAI Vertron III is a diffusion furnace and associated accessories used for the growth and thermal processing of semiconductor materials. Vertron III is manufactured by KOKUSAI Electric and well-known for its performance and reliability in R&D and production applications. KOKUSAI Vertron III is a single-wafer furnace capable of diffusing temperatures ranging from 300°C up to 1100°C. The core of the equipment is a quartz shale that houses an automated graphite susceptor able to fit substrates up to 8 inches in diameter. A long-life halogen lamp is used to illuminate the integrated camera for monitoring the process uniformity and is adjustable for different sizes of substrates. Graphite and SiC heating coils are used to provide the necessary heating and cooling rates within the chamber. Vertron III has an intuitive controller interface that contains an array of powerful operation and display functions. Features such as adjustable gas flow control as well as manual pump control are included with the system, allowing users to customize the process to meet their exact specifications. Additionally, process reports of up to 100-steps can be easily generated, providing a comprehensive overview of each process run. The included software is designed to monitor and control multiple parameters, such as temperature and furnace pressure, to ensure process reproducibility. Users can also configure a variety of process recipes to automate their processes and store them for future use. Safety features are also included, such as over temperature protection, forced gas shut-off, and vacuum pumps that are automatically shut off if the pressure inside the chamber exceeds the specified level. To ensure quality and long-term performance, KOKUSAI Vertron III is equipped with a high-pressure blower that helps reduce oxidation on the components and a water-cooling unit that helps prevent overheating. The furnace and accessories are backed by an AI-controlled auto-diagnostic machine designed to identify any maintenance issues and alert the user when maintenance is required. Additional upgrades are available that can increase the number of processing steps, improve tool accuracy, and reduce maintenance time. Overall, Vertron III from KOKUSAI Electric is an excellent choice when reliabilty and performance are needed in semiconductor production and R&D applications. With a wide range of processing temperatures and settings, intuitive user interface, and comprehensive process and safety features, KOKUSAI Vertron III is an ideal solution for any diffusion furnace needs.
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