Used TEL / TOKYO ELECTRON Alpha 303i #9095367 for sale

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TEL / TOKYO ELECTRON Alpha 303i
Sold
ID: 9095367
Wafer Size: 12"
Vertical oxide furnaces, 12".
TEL / TOKYO ELECTRON Alpha 303i is a diffusion furnace and accessory primarily used in the semiconductor industry to treat wafers and other materials with a diffusion process. TEL ALPHA-303I is a compact equipment that performs rapid thermal processing (RTP) at high temperatures and at a variety of wafer diameters. It is an efficient and highly productive system capable of running up to four distinct processes simultaneously. The distinct processes that can be run on TOKYO ELECTRON ALPHA-303 I are as follows: oxidation, annealing, rapid thermal processing, and diffusion. TEL ALPHA 303 I is equipped with a control device, known as Fuzzy Logic Control Unit, that allows it to accurately and quickly respond to various process parameters. The device allows operators to easily set and control the temperature profiles, the power supply voltage, and the furnace chamber pressure. Additionally, the control device can alert operators in the event of an error. ALPHA-303I has a large process chamber capable of accommodating up to twenty-four 4" or sixteen 6" wafers. The chamber walls are made of graphite and the chamber is further protected by an alumina clad shield, which helps to improve thermal insulation. The furnace is also equipped with a robotic shuttle machine that can transfer wafers from the loading station to the reactor and vice versa. When operational, the furnace chamber is heated up to a maximum temperature of 1500°C and has a temperature uniformity of less than ±10°C. The chamber pressure is constantly monitored and can be varied up to a maximum of 3-7Torr with an accuracy of 0.1Torr. The diffusion furnace is further equipped with a temperature profile sampling tool that limits the temperature range of the furnace by recording the temperature profile up to twenty times a second. ALPHA 303 I is designed for safe, efficient, accurate, and productive wafer processing. It is equipped with an exhaust port and can be connected to an appropriate vent asset for effective emission control. The model also features closed loop safety features that actively monitor the furnace and its exhaust equipment to ensure continuous safety and performance. Overall, TOKYO ELECTRON Alpha 303i is an efficient and productive diffusion furnace ideal for semiconductor processing applications. It is capable of rapidly reaching high temperatures with uniformity and accuracy and is equipped with a variety of safety features to ensure proper operation and emission control.
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