Used TEL / TOKYO ELECTRON Alpha 8S #190957 for sale

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ID: 190957
Wafer Size: 8"
Vintage: 1996
Nitride furnace, 8" Specifications: Process: Nitride Software version: TS-4000-1996 Power: 110AC One Phase / 208 AC 3Ph Loading configuration: 6 loader Main system: TS4000 Controller Photohelic Gauge Boat Elevator Wafer Load Automation 16 Cassette stocker Temperature Controller (M121) Furnace Monitor, Power Control Unit Remote Utility & Gas Cabinet Inner T/C for Ration Mix HCL Detector Auto Shutter Gas system (NH3, DCS) Options: (1) Signal Tower (2) Pitch Change Mechanism (3) UPS (4) GEM Communication N2 Load Lock Ambient Control Option Load size 170 wafers Load lock purge system Process gas NH3, DCS Gas Type - Convention Gas System Tubing material - Stainless steel Tubing Finish - Electro-polish Manual valve - Fujikin Fitting Type - VCR/UJR Air-Operated valve - Fujikin Filter - Millipore Regulator - Veriflo MFC - Aera Pressure transducer - Millipore or NAGANO 1996 vintage.
TEL / TOKYO ELECTRON Alpha 8S is a diffusion furnace & accessory used in semiconductor manufacturing. It is capable of performing vapor phase epitaxy (VPE), selective thermal oxidation, and silicon nitride deposition, as well as automating LED conversion processes. It features an easy-to-use automated loader with integrated computer control systems for precise temperature control and uniform wafer processing. TEL ALPHA-8S has a standard high temperature limit of 1250 degree Celsius, as well as a multi-zone temperature control system to regulate temperature over multiple regions. The advanced energy-saving design and state-of-the-art hot zone materials ensure high thermal performance and greater process uniformity. The air bearing spindle drive and deep-point chuck ensure precise substrate positioning and ease of use. TOKYO ELECTRON ALPHA 8 S also features an intuitive human-machine interface (HMI) with an array of display tools, including dual 6.5-inch monitors and zoomable GUI for easy monitoring of the process parameters. Other features include multi-thermal control for line and point heat (LPH) processing applications and remote maintenance for prevention of deposition-quality degradation due to abnormal usage. TEL / TOKYO ELECTRON ALPHA 8 S utilizes advanced technology and proprietary software to maximize the quality of the products while providing efficiency, cost savings, and optimal performance for process optimization and yield control. Its low reactivity aluminum alloy chamber and uniform eddy current and air-cooled shielding make it ideal for long- cycling operations. When combined with the price-competitive TEL automated substrate loader, ALPHA-8S provides customers with an integrated control system for a node-balancing environment, ensuring optimal process performance.
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