Used TEL / TOKYO ELECTRON Alpha 8S #190957 for sale
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ID: 190957
Wafer Size: 8"
Vintage: 1996
Nitride furnace, 8"
Specifications:
Process: Nitride
Software version: TS-4000-1996
Power: 110AC One Phase / 208 AC 3Ph
Loading configuration: 6 loader
Main system:
TS4000 Controller
Photohelic Gauge
Boat Elevator
Wafer Load Automation
16 Cassette stocker
Temperature Controller (M121)
Furnace Monitor, Power Control Unit
Remote Utility & Gas Cabinet
Inner T/C for Ration Mix
HCL Detector
Auto Shutter
Gas system (NH3, DCS)
Options:
(1) Signal Tower
(2) Pitch Change Mechanism
(3) UPS
(4) GEM Communication
N2 Load Lock Ambient Control Option
Load size 170 wafers
Load lock purge system
Process gas NH3, DCS
Gas Type - Convention Gas System
Tubing material - Stainless steel
Tubing Finish - Electro-polish
Manual valve - Fujikin
Fitting Type - VCR/UJR
Air-Operated valve - Fujikin
Filter - Millipore
Regulator - Veriflo
MFC - Aera
Pressure transducer - Millipore or NAGANO
1996 vintage.
TEL / TOKYO ELECTRON Alpha 8S is a diffusion furnace & accessory used in semiconductor manufacturing. It is capable of performing vapor phase epitaxy (VPE), selective thermal oxidation, and silicon nitride deposition, as well as automating LED conversion processes. It features an easy-to-use automated loader with integrated computer control systems for precise temperature control and uniform wafer processing. TEL ALPHA-8S has a standard high temperature limit of 1250 degree Celsius, as well as a multi-zone temperature control system to regulate temperature over multiple regions. The advanced energy-saving design and state-of-the-art hot zone materials ensure high thermal performance and greater process uniformity. The air bearing spindle drive and deep-point chuck ensure precise substrate positioning and ease of use. TOKYO ELECTRON ALPHA 8 S also features an intuitive human-machine interface (HMI) with an array of display tools, including dual 6.5-inch monitors and zoomable GUI for easy monitoring of the process parameters. Other features include multi-thermal control for line and point heat (LPH) processing applications and remote maintenance for prevention of deposition-quality degradation due to abnormal usage. TEL / TOKYO ELECTRON ALPHA 8 S utilizes advanced technology and proprietary software to maximize the quality of the products while providing efficiency, cost savings, and optimal performance for process optimization and yield control. Its low reactivity aluminum alloy chamber and uniform eddy current and air-cooled shielding make it ideal for long- cycling operations. When combined with the price-competitive TEL automated substrate loader, ALPHA-8S provides customers with an integrated control system for a node-balancing environment, ensuring optimal process performance.
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