Used TEL / TOKYO ELECTRON Alpha 805 #191404 for sale

It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.

TEL / TOKYO ELECTRON Alpha 805
Sold
ID: 191404
Wafer Size: 8"
Vintage: 1996
PAD / Liner / ISO diffusion furnace, 8" 1996 vintage.
TEL / TOKYO ELECTRON Alpha 805 is a diffusion furnace used for semiconductor processing. This high-end, lab-grade furnace is capable of performing various processes such as rapid thermal annealing (RTA), transistor fabrication, and high temperature diffusion. The furnace is also capable of supplying up to 210kw (kiloWatt) of peak heating power. This furnace has an all stainless steel interior, which comprises of an 8" round hot-zone. This is coupled with a graphite insulator to ensure homogeneous temperature distribution for uniform processing results. Moreover, the furnace can reach temperatures up to 1250°C for rapid thermal processing, and up to 950°C for diffusion processing. TEL Alpha 805 also offers precise temperature control with a stability of +/-0.2°C. Power is supplied to the furnace via a 480V / 3Phase / 60Hz AC power connection. Because of the high power requirements for the furnace, it is equipped with a 3-phase, variable frequency drive (VFD) that provides precise, reliable control for stable processing. The furnace can also be operated in either standalone or computer-controlled mode. An intuitive, multilingual touch-screen interface adds an extra level of convenience and user-friendliness to the system. TOKYO ELECTRON Alpha 805 also offers excellent safety features, including a thermal cut-off switch and oxygen monitor, as well as a 30-step, high-pressure vacuum system featuring 20mbar (milliBar), up to 0.5 Pascal Vacuum. Additionally, an integral, fully retractable cassette load-lock system allows for easy access and sample loading. For reliable and efficient wafer-level processing results, Alpha 805 is a great option. Its intuitive user controls, precise temperature control, high accuracy, and safety features make it an ideal diffusion furnace for any modern semiconductor lab.
There are no reviews yet