Used TEL / TOKYO ELECTRON Alpha 808SC #9104944 for sale

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TEL / TOKYO ELECTRON Alpha 808SC
Sold
ID: 9104944
Wafer Size: 8"
Vintage: 1994
TEOS Furnace, 8" 1994 vintage.
TEL / TOKYO ELECTRON Alpha 808SC is a diffusion furnace and accessory product. It is designed to meet the needs of advanced semiconductor manufacturing processes and developed for research and development applications. TEL Alpha 808SC has been engineered to be the fastest and most accurate furnace on the market. It features a 8-inch ultra-fast multi-zone furnace, allowing for high-precision temperature control in all heated and cooled zones of the chamber. The accurate temperature control achieved by this equipment can be used for deposition, diffusion, annealing, oxidation, and other heat treatments. Additionally, the chamber is equipped with a special graphite susceptor, which provides superior uniformity of the process. TOKYO ELECTRON ALPHA 808 SC features a pressure range of 1-100 Torr and a temperature range of 30-1400°C. The system is equipped with a wafer transport unit allowing for precision loading and unloading of wafers into the furnace chamber. It is also designed with a wide range of protective measures such as over temperature protection for the susceptor, oxide protectors, and a variety of gas purification systems. TEL ALPHA 808 SC also comes with an intuitive control machine. It is designed with a compliant approach for tool monitoring, process control, and process diagnostics. The asset provides real-time model information, allowing complete control of process flow to ensure the best achievable process results. Additionally, the control equipment is incredibly user friendly. ALPHA 808 SC is compact and space saving, perfect for a variety of small to mid-sized laboratories and research centers. It also includes a maintenance and diagnostics system, allowing for quick and easy access to operational status information. In conclusion, TOKYO ELECTRON Alpha 808SC is a powerful, accurate, and versatile diffusion furnace and accessory solution well suited for any modern semiconductor fabrication facility.
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