Used TEL / TOKYO ELECTRON Alpha 858SC #9034384 for sale

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TEL / TOKYO ELECTRON Alpha 858SC
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ID: 9034384
Wafer Size: 8"
LPCVD nitride furnace, 8" 150 wf.
TEL / TOKYO ELECTRON Alpha 858SC is a diffusion furnace and accessory equipment designed for heavy-duty environmental use. Featuring superior temperature and uniformity, TEL Alpha 858SC is capable of processing various materials for thin-film deposition, photomasks and other surface applications. It is equipped with a special purge system, allowing uninterrupted operation and cleaner results. Additionally, its high-precision and accuracy has made it remarkably superior in achieving fine and stable layer thickness when processing various materials. TOKYO ELECTRON Alpha 858SC utilizes a solid-state sensor to monitor temperature up to 1200°C, ensuring uniformity and reproducibility. Utilizing a low-current plasma source and a bottom-invert heater, the unit is designed to deliver a highly uniform temperature profile. The furnace's bottom-invert design ensures the uniformity of the temperature by diverting the plasma flow away from the furnace walls. For easy operation, Alpha 858SC comes equipped with a touch-screen monitor and controller that includes operator friendly software. It includes various features such as time-temperature curves, automatic purges, vacuum and gas control, load-lock management and process logging. The furnace can be easily connected to various vacuum systems (CAB, PEAK and Pfeiffer), vacuum gauges, mass spectrometers, helium leak detectors, particle detectors and other diagnostic systems. An integrated safety machine is integrated to ensure maximum security during operation. Extended Service, calibration and validation service ensures personnel safety all the time. TEL / TOKYO ELECTRON Alpha 858SC diffusion furnace systems are designed for long-term and consistence performance, and deliver superior temperature and uniformity in a wide variety of industrial applications. Through its precisely engineered and solid construction, it is capable of achieving high temperature uniformity, uniform layer thickness and longer life times than other diffusion furnaces.
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