Used TEL / TOKYO ELECTRON Alpha 8S #101454 for sale

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ID: 101454
Wafer Size: 8"
Vintage: 1998
LPCVD furnace, 8", 1998 vintage.
TEL / TOKYO ELECTRON Alpha 8S diffusion furnace is a versatile substrate heating system designed for industrial applications in the manufacturing industry. TEL ALPHA-8S contains two separate zones: a process chamber, used for forming substrates, and the cooling chamber which is used for high-speed cooling. The process chamber features high-density heating elements for quick, uniform substrate heating. A temperature range of 50 - 1200°C is reliably obtained through a Molybdenum-Rhodium thermocouple, ensuring precision temperature control throughout the process. The temperature may be controlled via a touch panel, or programmable logic controller (PLC). TOKYO ELECTRON ALPHA 8 S is built with an SC5 quartz susceptor, and has a maximum substrate size of 300 x 300mm. This ensures superior surface uniformity and uniform thermal diffusion to improve substrate detail, while effectively preventing damage and distortion caused by thermal stress. The cooling chamber is equipped with advanced cooling technology, providing rapid cooling rates, even with large substrates. TEL ALPHA 8 S diffusion furnace can be used in a variety of industries, including research, wafer and materials processing, and electrical devices. Additionally, optional accessories such as a gas box, exhaust hood, and chilled water system are available to provide efficient temperature adjustment and accurate distribution of gases, fumes, and heat. Overall, ALPHA-8S diffusion furnace is a reliable, versatile heating system designed for industrial applications. It provides precision temperature control, uniform thermal diffusion, and fast cooling rates, making it the ideal solution for a variety of processing needs.
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