Used TEL / TOKYO ELECTRON Alpha 8SE A8SE-ZAR #115117 for sale

TEL / TOKYO ELECTRON Alpha 8SE A8SE-ZAR is a diffusion furnace and accessorie designed for multiple wafer process applications. It is used to deposit thin layers on multiple substrates. The A8SE-ZAR is designed to maximize throughput, provide excellent uniformity, and enable high-precision control of film thickness and deposition rates. The A8SE-ZAR is based on a computer-integrated multiwafer platform, with uniform heating mechanisms. It is also equipped with a multi-chamber automation system, which enables it to support multiple process steps in a single process cycle. It is capable of processes such as oxide deposition, diffusion, oxidation, nitridation, metal deposition, inter-diffusion, etching, and patterning. The A8SE-ZAR is designed with an advanced CCD camera, which provides automatic inter-wafer alignment and greater accuracy. It also includes a Window CF filter, which reduces the incidence of particulate contamination. This filter even further prevents particles from entering the diffusion chamber. This contributes to improved process repeatability over extended runs. The A8SE-ZAR has process control capabilities built into its system. This includes temperature control throughout its chamber, as well as oxidation and nitridation parameters. It also has a proprietary diffusion recipe generation algorithm, which minimizes process uncertainties and produces more uniform results. The A8SE-ZAR also has a built-in Endura offline control feature, which allows for control of multiple recipes without disrupting the process. It is also equipped with an advanced RF generator, which reduces edge effect losses, resulting in uniformity and improved process yields. TEL Alpha 8SE A8SE-ZAR is a reliable diffusion furnace and accessorie, allowing customers to achieve high quality results in a cost-effective manner. It combines high-precision control and automation systems, enabling controlled and repeatable processes, with uniformity and process accuracy. It further includes control features such as the CCD camera, filter, and RF generator, all of which contribute to greater process repeatability and yield. This advanced and integrated wafer processing platform is well suited for the demands of the modern semiconductor industry.