Used TEL / TOKYO ELECTRON Alpha 8SE-E #9275714 for sale

TEL / TOKYO ELECTRON Alpha 8SE-E is a vertical batch thermal-processing equipment for single-wafer and multi-wafer applications. It has a component temperature monitoring system and a closed-loop temperature and pressure control unit. The machine is designed to deliver increased temperature uniformity and precision. Its design also provides a wide temperature range and a precise temperature control, making it suitable for a range of early- to late-stage semiconductor processes. TEL Alpha 8SE-E is a single-wafer, multi-batch diffusion furnace that is capable of both diffusion and impurity annealing processes. Its temperature range runs between 200°C and 1050°C, making it ideal for a variety of processes including diffusion, oxidation, nitriding, nitridation, and annealing. The furnace has an excellent temperature uniformity of ±1°C or better, allowing for uniform doping and thermal treatments of wafers. The furnace has a built-in top-loader and a gas flow tool that enables users to control the gas flow of the working atmosphere. It is made from low thermal mass, chemically inert material, allowing for fast thermal processing of wafers. It also features multiple lift motors, as well as a bottom-loader, for ease of loading and unloading the furnace. The wafers are loaded on a waferboat and aligned on a hexagonal holder. The asset is equipped with TSS (Thermocouple Sensor Model) which measures the temperature of the wafers with maximum accuracy. TOKYO ELECTRON Alpha 8SE-E also has a PID (Proportional Integral Derivative) control equipment for accurate pressure and temperature control even during high-temperature operation. This increases the versatility and accuracy of the processes. For safety purposes, the system is equipped with a high-temperature alarm. Its exterior is fitted with safety features such as a passcode-locked temperature control unit, as well as an accessible emergency stop switch. Alpha 8SE-E is a versatile and accurate diffusion furnace that offers users increased temperature uniformity, precision, and control. With its various capabilities, it is well suited for a variety of semiconductor processes and applications.