Used TEL / TOKYO ELECTRON Alpha 8SE ZVS #190711 for sale

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TEL / TOKYO ELECTRON Alpha 8SE ZVS
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ID: 190711
Vintage: 2000
LPCVD Furnace Process: SiH4 / Ph3 2000 vintage.
TEL / TOKYO ELECTRON Alpha 8SE ZVS is a state-of-the-art diffusion furnace and accessories specifically designed for advanced semiconductor applications. The equipment combines efficient operation with superior technology for processing highly integrated low-k dielectric films. With its patented ZVS technology, TEL Alpha 8SE ZVS can deliver high temperature uniformity and ultimate product quality. The system also has a patented load lock mechanism which allows for higher production yields and secure operation. TOKYO ELECTRON ALPHA 8SE-ZVS is equipped with a High Temperature Splinter Doortm as well as an adjustable top heater for maximum control over the substrate transport direction and heating process. This ensures that high temperature uniformity is achieved in the processing of highly integrated low-k dielectric films. The furnace also incorporates a vertical cooling belt unit to ensure uniform and rapid cooling of the process chamber. Additionally, the furnace has an integrated safety shutter which prevents irradiation of substrates. The machine is compatible with a number of preset process recipes and can be used with a variety of source gases including nitrogen, APCVD/ Plasma, Oxygen, H2O, etc. TEL / TOKYO ELECTRON ALPHA 8SE-ZVS also includes an advanced process control unit which enables users to easily monitor and control the parameters of the processing environment. The tool is also compatible with a variety of precision sensors to ensure accurate control of the processing atmosphere. In addition to TOKYO ELECTRON Alpha 8SE ZVS, a wide selection of optional accessories are available to suit a variety of processes such as wire bonding, MEMS, and other advanced semiconductor applications. These accessories include an Air Management Asset for precise, automatic control of process atmosphere, a Source Substrate Oscillation Arm for accurate positioning of the source substrate, as well as a Gas Supply Model for secure handling of all gases required in the diffusion process. ALPHA 8SE-ZVS is a highly reliable equipment that operates reliably and reproducibly in any continuous or batch processing environment. Its advanced technologies provide high levels of temperature uniformity and process control, ultimately resulting in a superior end product. With its affordable price range, comprehensive facilities and safety features, TEL ALPHA 8SE-ZVS is an ideal choice for advanced semiconductor applications.
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