Used TEL / TOKYO ELECTRON Alpha 8SE #116227 for sale
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ID: 116227
VF LPCVD ASG furnace
SMIF Type: Asyst
SMIF indexer: 2
Cassette transfer: cassette transfer
Wafer transfer stage : 2 stage
Cassette stock: Stocker(21)
Boat process: one boat 2 batch process
Wafer transfer: FORK(5)
Process reactor: one reactor one system
Heater: Five zones
Boat position: cooling, process and loading position
TC position:
Paddle TC: Between outer and inner tube
Spike TC: on heater
Injector:
ASP: 6 injectors
ASG: 5 injectors
Process gas:
ASP: N2/SiH4/H2/0.7%AsH3/ClF3
ASG: N2/O2/TEOS/Teasat/ClF3
MFC: UNIT
Boat material:
ASP: SIC
ASG: Quartz
Boat slot:
ASP: 170
ASG: 129
Process tube: Quartz
Outer tube: Quartz
Inner tube: Quartz
CLF3 dry clean: Yes
PUMP: EDWARDS/EBARA
System controller: WAVES
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TEL / TOKYO ELECTRON Alpha 8SE is a high-tech diffusion furnace and accessory used for the growth of semiconductor devices. This equipment is capable of rapidly and accurately growing layers of semiconductors onto substrates in order to meet the stringent demands of modern electronics manufacturing. TEL ALPHA-8SE is equipped with a state-of-the-art vessel incorporating an advanced radiant heating mechanism. This vessel allows for the uniform heating of gases within the vessel and strongly aids in creating an optimal growth environment for the semiconductors. This feature is especially useful for the growth of III-V materials such as gallium arsenide and indium phosphide. In addition to the advanced vessel, TOKYO ELECTRON ALPHA-8 SE implements a unique, fully automated control system. This unit offers precise temperature control as well as control of process times, gas flows, and other conditions. Furthermore, the machine features advanced capabilities for controlling both the temperature and composition of the growth environment, allowing for its full customization to match the requirements of any specific growth process. TEL / TOKYO ELECTRON ALPHA 8 S E also comes with a touchscreen interface for ease of operation and data acquisition. This allows users to accurately monitor and control the growth environment during the growth process. The graphics display further enhances the usability of the tool by providing a visual representation of the various parameters during the growth process. In conclusion, ALPHA 8 SE is an extremely advanced diffusion furnace and accessory asset. Its advanced vessel and full automation capabilities allow for the precise control of the growth environment, ensuring the optimal growth of semiconductors. Its touchscreen interface and graphics display further enhance the user experience, allowing operators to easily monitor and control the model during the growth process.
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