Used TEL / TOKYO ELECTRON Alpha 8SE #93399 for sale
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ID: 93399
Wafer Size: 8"
Vintage: 2004
Nitride LPCVD furnace, 8"
170 wafer slots
Tool Specific Information:
Heater Part No: VMM-40-101
Software Version: Ver3.11 R005 WAVE
System Power Rating: 110AC One Phase / 208 AC
Loading Configuration: 6 Loader
Main System:
WAVES Controller
Photohelic Gauge
Boat Elevator
Wafer Load Automation
21 Cassette Stocker
Temperature Controller (M560)
Furnace Monitor, Power Control Unit
Remote Utility&Gas Cabinet
Inner T/C for Ration Mix
Auto Shutter
Gas System (NH3, DCS)
Options:
Signal Tower
Pitch Change Mechanism
UPS
GEM Communication
N2 Load Lock Ambient Control:
Quartz ware
Load size 170 wafers
Load lock purge system
Process gas: NH3, DCS
Gas Type - Convention Gas System
Tubing material - Stainless steel
Tubing Finish - Electro-polish
Manual valve - FUJIKIN
Fitting Type - VCR/UJR
Air-Operated valve - FUJIKIN
Filter - MILLIPORE
Regulator - VERIFLO
MFC - AERA
Pressure transducer - MILLIPORE or NAGANO
Remote Components:
Utility Box Power Rating: 110/208AC
Pump Power Rating: 208AC-3 (Not Included)
UPS Power Rating: 110AC-1
MFCs Summary
MFC_NB (N2) 10sLm
MFC_NR (Pure-N2) 50sccm
MFC_NX (Pure-N2) 20sLm
MFC_NY1 (Pure-N2) 200sccm
MFC_NY2 (Pure-N2) 200sccm
MFC_N1 (Pure-N2) 5sLm
MFC_N2 (Pure-N2) 5sLm
MFC_M1 (NH3) 2sLm
MFC_D1 (SiH2Cl2) 200sccm
MFM_M1 (Pure-N2) 2sLm
MFM_D1 (Pure-N2) 200sccm
Packing List:
Power-Box
UPS
Main-Body
Gas-Box
Heater
O2 Analyzer
Vacuum Exhaust Pipe
Cables
Top Heater Frame
Filter Fan
Gas-Box Door
EXT IN Unit
Gas-Box Exhaust Support
Backend Pipings
Scavenger Flexible Duct
Accessories 2 white boxes + 1 wafer container
N2-LL Pipings Tray
(Qty 3) Cable Trays
Loading Area Cover
Backend Support/ Cover
(Qty 5) Heater Panels
Main-Valve
Crated in a warehouse
2004 vintage.
TEL / TOKYO ELECTRON Alpha 8SE diffusion furnace and accessories is an industrial-grade heating equipment and accessory package specifically designed for semiconductor laboratories. This diffusion furnace and its components offer an affordable and reliable solution for higher-temperature semiconductor processing, including dopant removal, annealing, and substrate deposition. TEL ALPHA-8SE system is equipped with an 8-inch loadlock chamber, allowing for a fast and consistent pre- and post-process loading of the furnace. It also comes equipped with a quartzware carrier, loadware carrier, and a substrate loader for maximum convenience. The built-in cooling fan helps to maintain a consistent temperature, ensuring reliable and consistent performance from process to process. TOKYO ELECTRON ALPHA-8 SE can process wafers up to 8 inches in diameter, making it perfect for semiconductor laboratories of all sizes. The built-in active closed-loop temperature control ensures accuracy, flexibility, and repeatability. The unit also features a menu-controlled software program that simplifies programming and ensures consistent results. TEL ALPHA 8S-E diffusion furnace and its accessories are made of high-quality materials, ensuring compatibility with a variety of semiconductor materials and deposition processes. Silicon, gallium arsenide, and diamond templates can all be processed in the machine. Its robust construction and design also make it robust and reliable in the toughest of laboratory environments. In any semiconductor laboratory, consistent quality is essential for reliable results. With TEL Alpha 8SE diffusion furnace and its accessories, users can achieve impressive and repeatable results, both in terms of quality and throughput capabilities. It offers a simple, straightforward solution to meet stringent semiconductor processing demands.
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