Used TEL / TOKYO ELECTRON VDF 615 #173224 for sale

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TEL / TOKYO ELECTRON VDF 615
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ID: 173224
Wafer Size: 6"
VCF LP PoCl3 Vertical Furnaces, 6" Ebara 150x40 Pumps, Delivery system.
TEL / TOKYO ELECTRON VDF 615 is a vertical diffusion furnace that is used for many types of integrated circuits including epitaxial silicon and compound semiconductors. It is designed to provide maximum efficiency and flexibility in order to achieve optimal thermal processing performance. TEL VDF 615 is designed with advanced technologies such as a base integrated furnace and advanced process controls. The furnace provides more precise and repeatable temperature profiles that enable reliable thermal treatments with lower energy consumption. The base integrated furnace eliminates the need for an external heating module making it more compact and economical. It also makes wafer transfer more efficient. The advanced process controls provide more accurate process control and improved repeatability leading to higher yields. TOKYO ELECTRON VDF 615 also features a high-performance heater with reliable metal splitter elements that provide a more uniform and stable heating process. There is also a special oxidation mode for controlling temperature accurately for oxidizing materials. Additionally, the furnace includes a variety of other features including hot and cold walling, degassing, and nitrogen atmosphere control for controlling atmosphere during epi-processes. VDF 615 also includes a suite of sophisticated accessories that enhance the user experience. These accessories include wafer polishing and cleaning systems, wafer exposure and demounting systems, wafer support systems as well as zone control systems to improve yield, by allowing more flexible temperature control across the different steps of the process. TEL / TOKYO ELECTRON VDF 615 is an excellent solution for any semiconductor process where high temperature and uniform thermal performance is required. Its advanced technologies and versatile accessories make it one of the best diffusion furnaces available. Its compact and economical design provide flexibility in process optimization allowing manufacturers and integrators to achieve the highest yields and performance of their integrated circuits.
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