Used PLASMOS SD 2002 #16921 for sale

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PLASMOS SD 2002
Sold
Manufacturer
PLASMOS
Model
SD 2002
ID: 16921
Wafer Size: 8
Vintage: 1998
Ellipsometer.
PLASMOS SD 2002 Ellipsometer is an optical film characterization equipment that measures the thickness and optical constants of thin films in a non-destructive and accurate manner. It is used in semiconductor processing, LCD production and optical coating materials analysis. SD 2002 utilizes a MgF2 beam splitter that is light and easy to use. It has an onboard computer with a touchscreen interface that guides you through the steps required to take readings. The system is able to automatically measure films that are as thin as 0.2nm and can measure films as thick as 1.2 μm. It also has a large dynamic range from 0 to 70 degrees of incidence. The unit has a data storage capacity of up to 1000 readings, and the data can be downloaded to a USB drive for further analysis. The machine features a full wavelength range of operation from 190nm to 1050nm, which allows it to measure films below 1nm in thickness. It has a 10mm beam spot, making it ideal for measurements of small-scale structures. PLASMOS SD 2002 has a wide range of sample holders, designed for different applications such as flat surfaces, V-groove samples and stepped samples. These sample holders make it easy to measure different film thicknesses with the same tool. SD 2002 is fully automated, making the measurement process efficient, fast and accurate. The asset also includes data analysis and visualization tools, allowing you to acquire, analyze and store data in a standardized format. It includes tools for reporting, model optimization, as well as plotting and graphing functions. The equipment also includes a user-defined library very useful in research applications. The library allows the user to store commonly used physical constants and sample types, which can be loaded into the system to make it easier to use. PLASMOS SD 2002 is an innovative optical film characterization tool designed to simplify the process of film characterization. It is the perfect fit for semiconductor processing and LCD production, and is reliable and user friendly.
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