Used RUDOLPH FE III #9063426 for sale

RUDOLPH FE III is an advanced optical ellipsometer used for the characterization of surfaces and thin films. It allows for quantifying optical properties such as refractive index, extinction coefficient and thickness of surfaces as well as thin layers and multilayers. It combines liquid crystal based modulation with infrared imaging spectroscopy to obtain characterization results with unprecedented accuracy and versatility. RUDOLPH FEIII is capable of acquiring spectroscopic data from mid-infrared to near-ultraviolet wavelengths, making it highly suitable for a wide range of industrial and research applications. It features a computer-controlled measurement chamber with five axes of motion, allowing for precise, automatic measurements on flat or curved surfaces without recalibration. Additionally, the head's tilt-motion compensation ensures that precise measurements are obtained regardless of surface orientation. The instrument also includes ultra-sensitive detectors that minimize the requirement for laser power, making it extremely useful for characterizing thin films and delicate surfaces. It is equipped with an automated, user-defined data acquisition program and can be easily programmed with an intuitive Windows® based software package. FE-III is optimized for evaluating the surface properties of adhesives, paints, coatings, and other optically active substances. Its sensitive infrared detectors can also be used to quantify the optical properties of semiconductor films such as refractive index and extinction coefficient. It is an invaluable tool for research in the fields of optics, material engineering, and semiconductor technology and is ideal for use in quality control, optical metrology, and thin film research laboratories. RUDOLPH FE-III can measure a wide range of optical parameters with ultra high precision. Its automated five-axis design simplifies the calibration process, and the tilt-motion compensation minimizes any requirement for recalibration when measuring flat or curved surfaces. Its ultra-sensitive detectors allow for extremely low power laser estimation, making the tool well-suited for thin film characterization. The instrument can easily be integrated with other analytical and scientific instruments, and its intuitive Windows® based software makes it simple to program. FEIII is the ideal tool for a broad range of industrial and research applications, from optically active surface characterization to semiconductor thin film analysis.