Used ALLWIN21 AW 105R #9201878 for sale

Name: ALLWIN21 AW 105R
Brand: ALLWIN21
SKU: 9201878
Availability: InStock

URL successfully copied!

Tap to zoom

Rapid Thermal Processors

Manufacturer

ALLWIN21

Model

AW 105R

ID: 9201878

Wafer Size: 2"-6"

Plasma etcher, 2"-6" Wafer loading: 3-Axis robot Stationary cassette plate Plasma power: 600W Air-cooled Type: Parallel / Single wafer process Gas lines: 1-3 Lines MFCs Main frame with circuit breakers, solenoid valves Keyboard, mouse, cables Anodized reactor with door Chamber base plate with water sensor Upper and lower electrodes Quartz showerhead & diffusion disk Main control and distribution PCBs RF Matching network with PCBs RF Generator: 13.56MHz Center aligner / Cassette station: Two dimensions Four dimensions Base plate and ceramic ring: Reactor Chuck In-line filter and solenoid isolation valve: One MFC Two MFCs Three MFCs AC/DC Box: Temperature controller MKS Baratron: Isolation valve Throttle valve Main vacuum valve Front EMO, interlocks Touch screen GUI, 15" Asher rate: 0.5-1.5 um/Min (200 to 250 ºC) Bulk strip: 600 A/Min (100 ºC) Uniformity: <±8% (Max-min) Strip: <±5% (Max-min) Particulate: <0.05/cm2 Selectivity: >1000:1 MTBF / MTTA / MTTR: 450 Hours / 100 Hours / 3.5 Hours / Better Production-proven plasma asher / Descum Uniformity: Up to 3%-5% Frontside and backside isotropic removal Consistent wafer-to-wafer process cycle repeatability Element heating: Up to 250°C Wafer capability (50mm-150mm): Up to 6.25” substrate Thickness wafer: 50um Options: End-of-process (EOP) Vacuum pump Chiller: Chamber base plate Applications: GaAs, InP, GaN, SiC Wafer strip GaAs, InP, GaN, SiC Wafer descum Thin film head resist cleaning Opto-electronic devices cleaning MEMS Photoresist stripping: High dose implant Rework Post-polysilicon Post-metal Post-oxide Controlled resist removal: Post-develop descum Uniformity capability: (<5% 1σ) Plumbed process gases: O2, N2 Cooling water: GPM House circulating supply Facility exhaust: 100 CFM Power: 190-240VAC, single phase, 30A, 50/60Hz.

Read More Close

ALLWIN21 AW 105R Rapid Thermal Processor is a precise thermal processing equipment ideal for a wide range of research and industrial applications. The state-of-the-art equipment utilizes a robust graphite heating block for consistent performance in temperatures up to 1250°C, and an ultra-precision temperature controller to provide unparalleled accuracy and stability during operation. AW 105R is engineered to enable rapid heating and cooling cycles, with an average time of 5 minutes. This allows for efficient and effective processing of any size material without sacrificing precision. ALLWIN21 AW 105R employs a rated power of 8.5kW, and features a unique interlocked door system to maximize safety during operation. The unit includes an intuitive graphical user interface, a vacuum-thermology process control, and an Anemometer/Humidity meter to ensure a safe and clean process environment. The machine is designed for easy maintenance and efficient operation. AW 105R Rapid Thermal Processor features a simple vacuum pumping tool and a high-quality graphite heating block with independent temperature measurement. With a fully automated control panel, users can quickly get up and running with minimal setup. ALLWIN21 AW 105R is equipped with a powerful motorized stage and a wide range of accessories, including quartz chambers, lifting devices, and multiple wafer heights. The asset is compatible with a variety of material substrates: Silicon wafers, polymer films, carbon nanotube arrays, biosensors, and more. AW 105R is capable of processing in Micro-Electro Mechanical Systems (MEMS) conditions, and a Fourier Transform-Infrared (FT-IR) analyzer is used to ensure highest quality analysis of obtained samples. The entire machine is modular and designed to accommodate a variety of future developments. In short, ALLWIN21 AW 105R Rapid Thermal Processor is the perfect equipment choice for those looking to quickly process a wide range of materials with complete accuracy and temperature control. With its high power rating and easy-to-use features, researchers can be sure that their sample is processed exactly as required without sacrificing any level of precision.