Used ALLWIN21 AW B3000 #9201806 for sale

Name: ALLWIN21 AW B3000
Brand: ALLWIN21
SKU: 9201806
Availability: InStock

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Rapid Thermal Processors

Manufacturer

ALLWIN21

Model

AW B3000

ID: 9201806

Wafer Size: 8"

Plasma asher / Descum equipment, 8" Production-proven plasma stripper Consistent wafer-to-wafer uniformity Main body with wires Control box Keyboard, mouse Transformer, circuit breaker, contactor Cables EMO, interlocks and watchdog function Quartz chamber: Diameter 12” x depth 23” Main control: PCB and DC Main body of tools: RF Match network integrated Chamber door with quartz plate Gas and vacuum lines connections Options: End-of-process (EOP) Throttle valve for pressure control Air-cooled RF generator Thermocouple: Chamber temperature Vacuum pump Lamp tower alarm with buzzer Main vacuum valve MKS Baratron Throttle valve Touch screen GUI, 15" High throughput: Up to 75 WPH Gas Lines: Up to 5 isolated gas lines with MFCs Asher rate: 0-0.1u/min Positive PR: >0.2u/min Negative PR Uniformity: Up to 25% Particulate: <0.05 /cm2 Selectivity: >1000:1 MTBF / MTTA / MTTR: 450 Hours / 100 Hours / 3.5 Hours Plasma power: Air-cooled RF 13.56MHz TC Option: N2 Plasma: Up to 170°C Types: Barrel / Batch Desktop Stand alone Wafer loading: Manual.

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ALLWIN21 AW B3000 is a rapid thermal processor designed for the highest quality of precision and accuracy. It utilizes advanced technology to provide a rapid thermal transfer from process to product and delivers superior control of temperature, time, and atmosphere for process control. The equipment features an advanced high temperature rapid thermal processor control, providing accurate thermal control during processing. AW B3000 supports process temperatures up to 2,700°C and a low noise environment for precision control. It also features a high protection design with a high temperature quench chamber for fast transfers. The processor incorporates an open-tube chamber design, allowing greater flexibility and control in terms of atmosphere during processing. ALLWIN21 AW B3000 is equipped with a direct heating system, allowing even heating throughout the processing chamber. It also ensures uniform temperature distribution at different levels of the chamber. The exact control and repeatability of temperatures is facilitated via a sophisticated temperature monitoring and control unit. It allows thermal control accuracy of +/- 1°C and time control accuracy of 0.001 second. To further ensure uniformity of temperature and fast reaction times, the temperature control machine is enhanced with an exposure shuttering tool. This asset also allows the user to accurately control the exposure time and number of exposures of each processing step. The model also includes customizable wafer lifters for fast loading and unloading of wafers and substrates. There is also an advanced automated wafer identification equipment, which allows for precise wafer loading and identification. Moreover, the system is equipped with automated data logging and reporting for real-time analysis and feedback. AW B3000 is a powerful and precise industry-standard rapid thermal processor. It offers superior precision, accuracy, and speed of processing, with advanced temperature control and reporting capabilities and customizable lift and suspension systems for easy wafer and substrate loading and unloading.