Used AMAT / APPLIED MATERIALS Centura 5200 Super-E #9116891 for sale

It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.

ID: 9116891
System Type: SNNF (3) Chambers.
AMAT / APPLIED MATERIALS Centura 5200 Super-E is a high-performance, high-purity, epitaxial reactor used for various epitaxial processes, such as chemical vapor deposition (CVD) and metalorganic chemical vapor deposition (MOCVD). This reactor boasts an impressive technical specification, and is capable of growth rates up to 65 nm/minute, offering the ultimate in cost efficiency. The design of AMAT Centura 5200 Super-E epitaxial reactor makes it a reliable and efficient tool for processing a variety of materials, including silicon, germanium, and gallium arsenide. It has a one-shot style susceptor lift, allowing for maximum yield and quality with minimal downtime. The susceptor lifts to allow for more uniformity in the growth zones in the reactor. APPLIED MATERIALS Centura 5200 Super-E epitaxial reactor features a set of hydride gas injection ports that are positioned to give excellent uniformity of gas delivery within the reactor. This ensures the highest quality growths of any substrate for various applications, ranging from LEDs and photonics to power electronics and wireless communications. Centura 5200 Super-E epitaxial reactor also features a custom-built, high-temperature vertical quartz injector, designed for increased process rate and product yield, and improved safety and reliability. This injector allows for the precise delivery and control of high temperature gases, and is common for applications such as silicon nitride passivations. For superior growth sensibility, AMAT / APPLIED MATERIALS Centura 5200 Super-E epitaxial reactor is equipped with a laser-based temperature sensing equipment. The unique temperature sensing system helps maintain a constant growth rate, leading to consistent process results, regardless of the substrate or process parameters being used. The epitaxial reactor also has an integrated super-low-vibration unit, which ensures consistent growth performance even in cases of intense vibration. This machine reduces the amount of heat generated, thus improving substrate and wafer quality. AMAT Centura 5200 Super-E epitaxial reactor is a versatile and reliable tool for epitaxial growth and other applications. The reactor's impressive features make it well-suited for a variety of applications and are ideal for use in both laboratory and production settings. It's high throughput and low cost makes it a great choice for advanced applications where quality and efficiency are paramount.
There are no reviews yet