Used AMAT / APPLIED MATERIALS Centura AP DPS II #9209227 for sale

ID: 9209227
Wafer Size: 12"
Vintage: 2006
Polysilicon etcher, 12" (4) Process chambers: DPS-ll With AGN ESC Missing parts: Qty / Name / Part number (1) / View window / 0200-36461 (1) / 10 Torr gauge / 135-00013 (1) / Ion gauge / 3310-0006 (1) / Bias match / 0190-03009 (1) / HV / 0090-00865 (1) / Foreline gauge /1350-01232 (1) / Ion gauge ISO valve / 3870-00021 (1) / Monochrometer EPD / 0010-05478 (1) / Slit door / 0020-64587 (1) / Slit door bellow / 0040-76767 (1) / NA Heated weldment TEE-KF 40 / 0190-23502 (1) / Heated weldment 7.09 KF 40 R / 0190-23503 (1) / MF Robot driver / 0190-17853 (3) / E84 Cables / - (2) / Special gas pipes / - 2006 vintage.
AMAT / APPLIED MATERIALS Centura AP DPS II is a reactor designed for processing materials used in the semiconductor industry. This reactor is capable of processing a wide variety of materials, including oxides, nitrides, silicides, and other semiconductor materials, with great precision and accuracy. The mechanics of AMAT Centura AP DPS II are based on the "Dynamic Pressure Sensing System" (DPS). This innovative system allows for precise and adjustable pressure control when processing or growing materials. The pressure and flow of gas, as well as the temperature of the reactants, are all monitored and maintained at precise levels. With the ability to process materials at differing temperatures, it enables flexibility in the type of material being processed. APPLIED MATERIALS Centura AP DPS II also features a gas manifold used to provide reactants such as nitrous oxide, nitrogen, and argon into the reactor chamber. This gas manifold allows for controlled flow of gases in the chamber, which helps to ensure the accuracy of the process. Additionally, the Plunger Injection System (PIS), provides precise control over the injection of charge materials. The design of Centura AP DPS II is also built for maximum safety. A resilient safety shield prevents splatter, and a dual charmonium reaction chamber keeps the process at optimal temperature. Additionally, a remote shutter is attached to the reactor chamber to ensure complete containment while in use. Furthermore, the advanced automation technology found in AMAT / APPLIED MATERIALS Centura AP DPS II provides users with the ability to monitor in real time, and remote control, certain aspects of the reactor process. This allows for greater accuracy and control, while also providing the user with data on how their processes have changed over time. When it comes to efficiency, AMAT Centura AP DPS II is at the top of its class. Its state-of-the-art design and advanced control features make it a reliable and trustworthy device for processing semiconductor materials. With its precise pressure control systems and robust corrosion-resistant construction, APPLIED MATERIALS Centura AP DPS II is an ideal device for growing, processing, and characterizing materials used in the semiconductor industry.
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