Used AMAT / APPLIED MATERIALS Centura DPS II #293607532 for sale

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ID: 293607532
Etcher SEIKO SEIKI STP-A2503PV Part number: 65048-PH52-AFS1 Poly chamber assembly.
AMAT / APPLIED MATERIALS Centura DPS II is a multi-frequency, rapid thermal processing (RTP) reactor that is designed for high-performance, highly integrated semiconductor wafer applications. This equipment provides superior temperature uniformity and reliability for the most demanding applications. It features a high-temperature reaction chamber, a horizontal gas flow delivery system, and a dynamic temperature control unit to ensure optimal processing temperatures. AMAT Centura DPS II is a versatile tool that is used in a wide range of applications, including deposition, oxidation, diffusion, anneal, and epitaxy. APPLIED MATERIALS CENTURA DPS+ II is composed of two parts: the high-temperature reaction chamber and the dynamic temperature control machine. The reaction chamber can reach temperatures ranging from 100 °C to 1100 °C and is designed for high-temperature wafer reactions. Moreover, the reaction chamber features an isolated thermal conduction tool to ensure uniformity of temperature within the chamber. The DPS II also features a horizontal gas flow delivery asset that delivers a high flow-rate (up to 200 slpm) of gas particles through the reaction chamber to ensure uniform reaction conditions throughout the process. The dynamic temperature control model allows for precise temperature control to ensure optimal process results. The temperature can be adjusted in real-time for each wafer to ensure consistent results. In addition, the equipment features a high-frequency sparker that allows for sub-second temperature processing. This is important for complex processes and minimizes the possibility of undesired results due to an extended processing time. Centura DPS II is ideal for applications in which absolute control over temperature, uniformity, and speed are required. The system is well-suited for a range of processes, including deposition, oxidation, diffusion, anneal, and epitaxy, and is the ideal solution for a wide range of advanced semiconductor processes. AMAT CENTURA DPS+ II is a highly reliable, customizable, and cost-effective solution for high-performance, integrated semiconductor applications.
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