Used AMAT / APPLIED MATERIALS Centura I P1 #9133087 for sale

Name: AMAT / APPLIED MATERIALS Centura I P1
Brand: AMAT / APPLIED MATERIALS
SKU: 9133087
Availability: InStock

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Reactors

Manufacturer

AMAT / APPLIED MATERIALS

Model

Centura I P1

ID: 9133087

WxZ system, 6" Chamber Type/ Location Position A WXZ Position B WXZ Position C WxP Position D WxP Position E MULTE COOLDOWN Position F ORIENTER Electrical Requirements Line Voltage 200/208 VAC Line Frequency 50~60 Hz System Safety Equipment EMO Guard Ring INCLUDED Water and Smoke Detector ALARM System Labels ENGLISH with Chinese simplified Wxz Chamber Options Bias Generator STANDARD ENI 12B3 Slit Valve Oring STANDARD Throttle Valve STANDARD THROTTLE Wxz Chamber Options Bias Generator STANDARD ENI 12B3 Slit Valve Oring STANDARD Throttle Valve STANDARD THROTTLE Wxz Chamber Options Bias Generator STANDARD ENI 12B3 Slit Valve Oring STANDARD Throttle Valve STANDARD THROTTLE Wxz Chamber Options Bias Generator STANDARD ENI 12B3 Slit Valve Oring STANDARD Throttle Valve STANDARD THROTTLE Orienter Chamber Options Chamber Type MULTE COOL DOWN Pallet Options General Mainframe Options Facilities Type REGULATED Facilities Orientation MAINFRAME FACILITIES BOTTOM CONNECTION Weight Dispersion Plates Mainframe And Remote Chamber Flow Switch Options Loadlock/Cassette Options Loadlock Type Narrow Body AUTO ROTATION Loadlock Platform UNIVERSAL Cassette Type Supported 200 mm Loadlock Cover Finish ANTI-STATIC PAINTED Loadlock Slit Valve Oring Type VITON Wafer Mapping ENHANCED Integrated Cassette Sensor YES Transfer Chamber Options Transfer Ch Manual Lid Hoist YES Robot Type HP Robot Blade Option ROUGHENED AL BLADE Wafer On Blade Detector BASIC Loadlock Vent BOTTOM VENT System Controller Controller Type Cntrlr Electrical Interface BOTTOM FEED Controller Exhaust TOP EXHAUST System Monitors System Monitor 1 STANDALONE Monitor Cursor BLINKING CURSOR AC Rack Controller Facility Interface REMOTE UPS INTERFACE ONLY

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AMAT / APPLIED MATERIALS Centura I P1 is a single-wafer cluster tool for semiconductor manufacturing. It is designed to create a unique, low-temperature shallow trench isolation (STI) process to reduce device stress due to polishing, etching, and vacuum processing. This reactor supports both low-k and dielectric polishing processes, enabling device structures with increased scaling capability and improved performance. It also boasts an advanced wafer transfer mechanism for improved accuracy and repeatability of process steps during manufacture. AMAT Centura I P1 reactor is a thermal chemical oxide (TCO) cluster tool designed to provide a high-performance STI solution while mitigating adverse environmental and manufacturing risks. At the heart of the tool is a DEIONIZED WATER (DI) Ultrashower, which ensures a precise and repeatable wafer temperature profile during processing. The tool executes a flow of DI and a specific set of gaseous precursors to form isolated trenches or pits in the wafer. The result is a truly uniform wafer-scale STI process that reduces device stress levels and increases performance. APPLIED MATERIALS Centura I P1 reactor is also equipped with a Low Temperature End-Point detector (LTEP) that accurately measures the end-point of the process. The LTEP maintains a preset uniformity for the STI process which results in clean, repeatable and uniform results. The tool also offers a low-k polishing capability that reduces parasitic capacitance between adjacent transistor nodes. This is a key process for device structures that need more scaling and improved performance. The tool is also equipped with an advanced wafer transfer mechanism that facilitates easy loading and unloading of wafers. It offers vertical wafer alignment for more accurate tracking of the wafer edges during the process, thus improving the wafer-to-substrate repeatability. Centura I P1 reactor is ideal for those in need of low-cost and high-performance STI process applications. With its low-k polishing and wafer transfer capabilities, it is a cost-effective and reliable tool for those in need of yield-critical, reduced-stress, consistently repeatable, and uniform STI results.