Used AMAT / APPLIED MATERIALS P5000 #293609326 for sale

AMAT / APPLIED MATERIALS P5000 reactor is a type of chemical vapor deposition (CVD) equipment designed specifically for thin film deposition of solid materials on various substrates. It is used in semiconductor manufacturing processes to provide conformal and homogenous deposition of thin films such as silicon nitride or silicon oxynitride. AMAT P-5000 reactor enables high throughput with good uniformity and excellent pressure control. This makes it suitable for multiple processes and layers of deposition. APPLIED MATERIALS P 5000 reactor consists of three main components: the CVD reactor, a vacuum systems and a control system. The CVD reactor is equipped with an electrostatic fragmentation nozzle to ensure a uniform spray of the precursor material. The vacuum unit consists of a turbo-molecular pump, a backing pump and the feed gas inlet and outlets. The pressure of the reactor is controlled by two mass flow controllers which are connected to the feed gas inlet and outlet tubing. The control machine consists of a PLC controller with a touch screen panel, a programmable logic controller (PLC) and feed gas flow controllers. AMAT / APPLIED MATERIALS P 5000 CVD reactor is widely used in the semiconductor industry for a variety of applications such as thin film deposition of silicon nitride, low-k dielectric layers, titanium nitride, tantalum nitride, tungsten and more. P-5000 has excellent deposition uniformity, which is particularly beneficial for deposition of conformal, thin film layers such as for metallization layers for electrical interconnects and for capping layers for integrated circuits. It also offers a wide range of process temperatures (up to 1100 °C), high throughput and can be used for advanced processes such as atomic layer deposition (ALD) and chemical vapor infiltration (CVI) deposition of thermally stable materials. Additionally, the tool is easy to maintain and offers a wide range of process parameters such as pressure, temperature, and flow rate that can be adjusted to optimize process results. Overall, APPLIED MATERIALS P-5000 CVD reactor is an advanced asset that enables high throughput and deposition of homogenous, uniform thin films. It is a reliable and durable reactor and is suitable for a wide range of semiconductor applications.