Used AMAT / APPLIED MATERIALS P5000 #293609327 for sale

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AMAT / APPLIED MATERIALS P5000
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ID: 293609327
Wafer Size: 8"
Oxide etcher, 8" MxP+.
AMAT / APPLIED MATERIALS P5000 is an advanced physical vapor deposition (PVD) reactor equipment, used for thin film deposition for the production of complex structural and optoelectronic devices in the semiconductor industry. This reactor features an integrated low temperature evaporation source with a high-temperature quartz substrate holder, which provides reliable and efficient deposition processes. AMAT P-5000 also includes an innovative substrate transfer system, which enables the transfer of up to 20 wafers per minute and ensures shorter cycle times. APPLIED MATERIALS P 5000 has several different chamber designs, all of which are designed to maximize productivity and performance. The dual pocket design enables both standard and mid-frequency RF plasma, while the split pocket design provides extra gas isolation, superior angular orientation and extremely fast wafer transfer. All chambers are also equipped with state-of-the-art temperature controllers, which ensure reliable process control and uniform thin-film deposition. APPLIED MATERIALS P-5000 also features several other advanced technologies, such as a multi-layer thin-film deposition unit that allows for the deposition of complex multi-layers within the same process, as well as high throughput batch furnace technology for fast substrate deployment. Moreover, the machine includes a number of sensors, monitors and control systems, which provide real-time feedback and diagnostic capability to the operator. This enables the operator to adjust parameters if needed and greatly improve process stability and reliability. The tool also includes several safety features, such as an auto-magnification asset that automatically shuts off precursors in the case of an unexpected high-energy plasma arc, as well as Batch Reactor Manual Mode, which enables full manual control over the bathers and their operation. Additionally, AMAT P 5000 model can be enriched with external vacuum pumps, such as Helium pumps, to ensure clean process conditions. Overall, AMAT / APPLIED MATERIALS P-5000 is a powerful and reliable PVD reactor equipment. With its various chamber designs, advanced technologies and safety features, it ensures precise and efficient deposition processes, while also guaranteeing process stability and reliability.
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