Used AMAT / APPLIED MATERIALS P5000 #293609328 for sale

AMAT / APPLIED MATERIALS P5000 is a state-of-the-art plasma etch reactor used for the etching of semiconductor materials and integrated circuits. This plasma etch reactor is designed to ensure precise and repeatable results with advanced uniformity performance. It features an advanced plasma source, process chamber design, wafer handling systems, and an intuitive control system. AMAT P-5000 is designed to provide high precision and efficient plasma etch processes for many different materials. APPLIED MATERIALS P 5000 plasma etch reactor consists of a process chamber, a high frequency radio frequency (RF) power source, a vacuum pump and a transport robot. The process chamber is made of stainless steel and is hermetically sealed to ensure a controlled vacuum environment. Inside the process chamber are two electrodes, one in the form of a substrate holder, and the other in the form of a hollow cylindrical magnetron. The substrate holder is used to transport the substrate and to supply the applied voltage between it and the magnetron electrode. The magnetron electrode is capable of producing an oscillating proton beam, which ionizes the gas molecules within the chamber. The high frequency RF power source provides the energy to create and sustain the plasma in the chamber. The magnetron typically operates at a frequency of 13.56 MHz, but other frequencies can be used. The RF power source also contains a power supply, a waveguide, and a matching network. The power supply provides the DC and RF power, and the waveguide and matching network regulate the signal to ensure optimal plasma conditions. The vacuum pump ensures that the chamber is free of unwanted gas, providing a base pressure of 10-4 Torr. A transport robot is used to increase the throughput, enabling multiple wafers to be processed at the same time. In addition, AMAT P5000 features an intuitive control system, allowing users to easily adjust the parameters of the etch process. AMAT P 5000 is a highly advanced plasma etch reactor, capable of accurately etching semiconductor and integrated circuits with repeatable results. With its advanced RF power source, process chamber design, transport robot, and intuitive user-friendly control system, P 5000 is capable of providing excellent process performance.