Used AMAT / APPLIED MATERIALS P5000 #293620909 for sale

AMAT / APPLIED MATERIALS P5000 is an advanced plasma reactor designed to enhance the production and purity of compound semiconductor materials used in applications such as microelectronics and optoelectronics devices. Utilizing a unique, high pressure, inductively coupled plasma (ICP) source, AMAT P-5000 reactor is capable of producing high-quality semiconductor materials with improved performance, higher yields, and improved properties compared to conventional low-temperature deposition techniques. APPLIED MATERIALS P 5000 reactor is equipped with a unique, patented design that provides superior process control and uniformity compared to traditional ICP sources. The plasma source utilizes advanced capacitor technology for generating the foundation for an advanced two-dimensional plasma plume with higher densities and controlled pitch angles. This provides a wider variety of desirable process parameters and yields higher quality materials. APPLIED MATERIALS P5000 reactor uses a deposition process that is capable of generating high-quality, ultra-pure compound semiconductor materials such as gallium arsenide (GaAs), gallium nitride (GaN), indium gallium phosphide (InGaP) and other III-V materials. The reactor enables vapor phase deposition of functional layers on substrates cooled to temperatures as low as -20 degrees Celsius (°C), allowing for the formation of high-quality electrical contacts and grayscale patterning. This advanced ICP source does not require the addition of etching or cleaning gases for successful processing and instead relies upon high deposition power consumption for uniform film deposition. This feature also reduces waste and pollution caused by etching and cleaning processes. AMAT P 5000 reactor is equipped with a unique, patented power solution which regulates the energy input during deposition, providing a uniform and repeatable deposition process. The sensitivity of the system to changing process parameters allows the user to make quick adjustments and quickly optimize the deposition process. The versatility and range of process parameters possible with AMAT / APPLIED MATERIALS P 5000 reactor allow it to be used in various applications such as fabrication of LEDs, integrated circuits and optical devices. P 5000 reactor is built with a solid chassis for maximum reliability. It is backed by comprehensive service options for day-to-day operation and maintenance. In summary, AMAT P5000 is an advanced plasma reactor used in the fabrication of compound semiconductor materials for applications such as microelectronics and optoelectronics. It features a unique, high-pressure ICP source, enabling vapor phase deposition of functional layers on cooled substrates, as well as uniform and repeatable coating. AMAT / APPLIED MATERIALS P-5000 is an ideal choice for achieving high-quality, ultra-pure materials with improved performance, higher yields and improved properties compared to traditional low-temperature deposition techniques.