Used LAM RESEARCH 4240 #146147 for sale

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LAM RESEARCH 4240
Sold
Manufacturer
LAM RESEARCH
Model
4240
ID: 146147
Wafer Size: 8"
Poly etchers, 8", de-installed.
LAM RESEARCH 4240 Asher is a revolutionary etching solution that is specifically designed for the advanced semiconductor production environment. With its superior processing parameters, 4240 has the capability of achieving finer geometries, higher yields, and vastly improved throughput. LAM RESEARCH 4240 utilizes a variety of technologies to achieve outstanding etch results. These include independently temperature-controlled exhaust and chamber, internal stabilizers to ensure uniformity across entire wafer, and active thermal cleaning. This enables the equipment to reach extreme etch rates without compromising on critical parameters, such as critical dimension (CD) and dielectric breakdowns. 4240 system makes use of an advanced, 3-zone coil delivery unit. This machine ensures constant anisotropy and uniformity across the entire wafer, even at higher etch rates. Furthermore, this coil delivery tool also facilitates uniform temperature control across the entire chamber, so that the etch process is consistent and efficient. This also helps to reduce dielectric breakdowns and minimize the need for post-process tuning. LAM RESEARCH 4240 also makes use of a number of advanced controllers to guarantee precise etch results. These include a PID temperature controller, adaptive frequency controllers, and advanced pressure density controllers. The asset also uses an automated bypass process to maximize throughput and prevent dielectric breakdowns. Overall, 4240 Asher is an incredibly powerful etching solution, ideal for advanced semiconductor production. Its advanced features and superior process parameters enable it to achieve incredibly fine geometries and high yields. Furthermore, its robust controllers and 3-zone coil delivery model ensure uniformity across the entire wafer, while its advanced bypass process allows it to increase throughput and minimize the need for post-process tuning.
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