Used LAM RESEARCH TCP 9600 #190003 for sale

Name: LAM RESEARCH TCP 9600
Brand: LAM RESEARCH
SKU: 190003
Availability: SoldOut

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Etchers / Ashers

Manufacturer

LAM RESEARCH

Model

TCP 9600

ID: 190003

Wafer Size: 8

Etcher, 8" Software: Classic rev. H Top RF generator: RFG 1250 Bottom RF generator: RFG 1250 Halo DSQ Strip RF generator: RFG 1250 ESC ESC Power supply Entry lock pump: EBARA 40 x 20 Main chamber pump: EDWARDS IH80 DSQ Strip pump: EBARA 80 x 25 Turbo pump: L&H MAG 1500 Vat valve: VAT 65 Endpoint detector Opt: A 703, B 394 Chiller: NESLAB LAC-101 He manometer: 20 T He UPC: 50 sccm Ref manometer: 10 T Turbo manometer: 10 T Cham manometer: 1 T DSQ Manometer: 10 T WDVS: Integrated Main chamber: Enhanced DSQ Gas ring: (32) Holes RF Window Focus ring Filler Ring Plate TOP RF Chamber liner Gas 1 MFC: CL2 100 sccm Gas 2 MFC: BCL3 200 ssm Gas 3 MFC: AR 100 sccm Gas 4 MFC: N2 10 sccm Gas 5 MFC: SF6 200 sccm Gas 6 MFC: O2 1000 sccm Gas 7 MFC: O2 2000 sccm Gas 8 MFC: CF4 200 sccm Gas 9 MFC: n/a Gas 10 MFC: H20 500 sccm Currently warehoused.

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LAM RESEARCH TCP 9600 is a thermal processing (etching/ashing ) tool that is used in the semiconductor manufacturing industry. It is a fully automated tool, with the capability to process both 3D and 2D substrates. It provides for low-temperature etching, high-temperature annealing, rapid thermal processing (RTP) as well as high-density plasma (HDP) and low-pressure chemical vapor deposition (LPCVD) processing. It has a process range of up to 1000°C and features low-world-wide-web (WWW) leakage, uniform temperature distribution and heat radiation in an enclosed chamber, and a 0.1°C temperature resolution. LAM RESEARCH TCP9600 also includes a Quadlink plasma add-on, providing for high-density and low-energy plasmas for plasma-enabled etching. It is capable of etching processes that require various profiles, such as particle deposition, oxidation, nitridation and ion implantation. The tool also offers a VersaLink upgrade, allowing for simultaneous running of both etching and plasma processes. It features a removable plasma chamber and comes with an adjustable rail- and motor-driven gas distribution system. TCP-9600 can be integrated with an SEMI-compliant standard factory automation system (FAS). It supports barcode and linear encoders, as well as both automatic and manual operations. It also reduces scrap, minimizes maintenance and is specifically designed to reduce cost-of-ownership. LAM RESEARCH TCP-9600 provides superior uniformity, repeatability and lifetime performance for customer satisfaction. It is the best choice for the semiconductor processing industry, due to its reliability, performance, and cost-effectiveness. It is rated for a flow rate of 600 liters per minute and is equipped with filter cartridges for clean process exhaust. The additional option of the VersaLink upgrade extends the capabilities of TCP9600, allowing for a broader range of applications. Overall, TCP 9600 is a highly efficient and reliable tool, ideal for high-volume etching and annealing applications. It's easy-to-use setup and adjustable features make it ideal for research and development and production environments. With its exceptional range of process capabilities, it is the perfect thermal processor for high-quality results.