Used MASTERETCH 635 #178487 for sale

MASTERETCH 635 is an etcher/asher designed for high-resolution pattern transfer from a photomask to a substrate. It is one of the most reliable, precise and efficient 30-kW asher systems on the market. The equipment is used for etching and ashing a variety of materials such as silicon, gallium arsenide and other metals, fused silica and diamond-like carbon (DLC). It features a vibration-free enclosure that allows for accurate and repeatable pattern transfer. The system includes a high-efficiency wafer stage and an adjustable light source that enables maximum yield and production throughput. It also features a long-life light source and a particle-free environment. Utilizing a unique MaskCloudTM technology that masks the substrate and provides exceptional transfer accuracy, 635 produces patterns with a 0.1-micron resolution. Additionally, the unit also features advanced resolution control with a sub-micron registration accuracy. The machine also allows users to set multiple etching and ashing parameters, including etching voltage, etching current, and etching time, as well as the anisotropic etching angle. For further precision, it also allows the user to adjust the anisotropic etching angle for improved linear etching resolution. MASTERETCH 635 is an ideal choice for high-volume production requirements in the semiconductor and microelectronic industries. Its robust design, ease of use, and precision accuracy make it stand out from other etching machines. Moreover, its process monitoring capability ensures reliability, quality and consistency in every part of the etching process. The process monitoring can be done remotely or self-monitored. In addition, the tool supports a wide range of materials, and its unique variable-angle pattern transfer option allows the user to fine-tune the pattern resolution. Overall, 635 is one of the leading etching systems on the market. Its high accuracy, long-life light source, and intuitive interface make it an ideal choice for high-volume production requirements. Moreover, its unique features make it easy to use and set up, enabling users to obtain maximum yield and performance out of their etching asset.