Used MRC 51 #168174 for sale

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Manufacturer
MRC
Model
51
ID: 168174
Reactive ion etch system.
MRC 51 is an etcher and asher with a range of functions used for the electrically and mechanically controlled creation of high-precision metal and metal alloy components. Its highest capability is for processing metals using the carbon dioxide laser, giving it superior performance levels to many other conventional etchers and ashers. 51 has a number of advantages over conventional models as it has a narrower spot size (of 200 lm or less). This enables a higher-quality finish and precision to be achieved, both in terms of accuracy and speed. It is also capable of processing much thicker metals than most other etchers due to the higher power of its laser. Compared to other systems, MRC 51 has a smaller footprint and is much lighter, making it more convenient to transport and use in tight spaces. It also has a quiet operation which makes it suitable for EPA-regulated environments. The equipment can also be programmed with measurements most commonly used in either English or Metric, allowing for a great deal of flexibility when it comes to processing. 51 is also compatible with a range of materials, including steels, stainless steels, copper, brass, and aluminum alloys - making it suitable for a wide range of applications. The system is ideally suited for precision tool and mould making, machining operations, die-casting, and the production of delicate micro-structures. In addition to these features, MRC 51 also has an automated surface detection unit, which makes it possible to accurately detect edges, changes in surface, and uniformity during the processing. This eliminates the need for manual tampering and provides a higher-level of precision to ensure more accurate results. 51 is a complete, high-precision machine designed for low-cost, fast and precise production of metal and metal alloy components. Its range of capabilities and features make it an invaluable tool for precision applications in industries and engineering fields.
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