Used AMAT / APPLIED MATERIALS xR80 Leap II #9243467 for sale

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AMAT / APPLIED MATERIALS xR80 Leap II
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ID: 9243467
Precision implanter.
AMAT / APPLIED MATERIALS xR80 Leap II is a top-of-the-line ion implanter and monitor for the semiconductor industry. This is a versatile, heavy-duty device capable of implanting various types of ions into substrates for advanced display, integrated circuit, and memory device production. It is designed to quickly and reliably implant ions into substrates for consistent product quality and performance. AMAT xR80 Leap II is an x-ray ion implanter that consists of a high-pressure ion source, an implanter chamber, a beam line, a mass-separated beam line, and a wafer handler. The ion source contains a tungsten filament, which provides the ions to be implanted into the substrate. The implanter chamber then accelerates the ions to a velocity necessary to penetrate the substrate. The beam line creates a steady, uniform beam of ions along a designated path, and a mass-separated beam line sorts the ions according to their mass to ensure the correct type of ion is implanted into the substrate. Finally, the wafer handler places the substrate in the exact position needed for implanting. APPLIED MATERIALS xR80 Leap II's ion implanter is controlled by a CMC-7000XR Software suite, which provides complete control over all of the major features of the system, allowing for precise implantation parameters. It also includes an integrated Optimization Window, which allows engineers to modify and compare various implantation scenarios to ensure the best performance from each device being produced. XR80 Leap II is well-suited for performing tasks such as impurity gettering, masking, surface activation, and passivation. The ion implanter and monitor offer precise process control, ensuring high product yields and consistent product quality. Additionally, AMAT / APPLIED MATERIALS xR80 Leap II supports advanced beam energy control systems and sophisticated Failure Analysis tools, for advanced diagnostic capabilities. AMAT xR80 Leap II is an advanced, heavy-duty ion implanter and monitor, designed to meet the increasingly stringent demands of the semiconductor industry. Its versatile design and integrated software suite allow engineers to quickly and reliably implant various types of ions into substrates, resulting in reliable, consistent device performance.
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