Used EATON NOVA / AXCELIS NV 6200A #9275794 for sale

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ID: 9275794
Vintage: 1990
Medium current implanter Missing and broken parts CTI CRYOGENICS 8500 Compressor Cryo-Torr 8 Cryo pump Dry pumps: EDWARDS QDP80 EDWARDS QDP40 + QMB250 Power supply: 200-208 V, 50/60 Hz, 6.6 kV, 3 Phase Process gas: BF3, PH3, AsH3 Power supply: 208 V, 70 A, 3 Phase 1990 vintage.
EATON NOVA / AXCELIS NV 6200A is an advanced ion implanter and monitor equipment developed by Eaton Corporation and trusted by industry professionals for its reliable performance, high throughput, and precise control. AXCELIS NV 6200A device consists of a source consisting of an RF-capable source, as well as components that enable the precise delivery of ions. This enables a high current density which is readily achievable with stable dose, current, and energy. In addition, the integrated scanning technique, diode laser technology and the Pulse Laser Beam (PLB) allow EATON NOVA NV-6200A to offer precise control over beam characteristics, including spot size and shape. In addition, NV-6200A features a patented Digital Beam Control (DBC) system, which offers an adjustable beam current, enabling operators to fine-tune the end-application requirements. This coupled with an advanced software package encourages maximum ion utilization, while minimizing ion beam aberrations. EATON NOVA NV 6200A achieves highly consistent and extremely precise results with excellent reproducibility without the need for special skills. After charging the gun with ions, the unit is designed for full automation of wafer processing and implant patterning. It can be characterized as a cost-effective device for manufacturers with high-end implanting needs. Furthermore, AXCELIS NV-6200A is user-friendly and offers a range of chamber capabilities and environment controls such as low-pollution pumping and temperature control. As such, this machine is well suited for implanting a wide variety of materials, such as Si, GaAs, InAs, and even biological materials. NV 6200A is an impressive ion implanter and monitor tool which offers ideal performance at a competitive price point. It benefits from an adjustable beam current and sophisticated scanning technique, providing users with complete control over implant patterning. Furthermore, the asset is reliable, automated, user-friendly and offers excellent reproducibility, making it the trusted choice of industry professionals.
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