Used EATON NOVA / AXCELIS NV-GSD-A-80 #9239611 for sale

An EATON NOVA / AXCELIS NV-GSD-A-80 is an advanced high performance ion implanter and monitor equipment which combines reliable precision implanting technology and a highly flexible, sophisticated monitor system. This unique unit offers faster cycles/second and higher accuracy than other systems, while also providing more flexibility in the range of implants, requirements for shielding and gas delivery. The Ion Implanter is the first step in the process of implanting of material into a semiconductor substrate. AXCELIS NV-GSD-A-80 is designed to provide highly precise levels of ion implantation to precision pattern features present on a semiconductor wafer substrate. It is capable of implanting a range of dopants, including phosphorous, arsenic, boron, antimony, gallium, as well as dopant-free substrates. EATON NOVA NV-GSD-A-80 is equipped with a powerful magnet which allows for a high level of control over the beam arc angle and velocity at a given energy level. This ensures the optimal implant depth and uniformity across the surface of a wafer. In addition, its advanced cooling machine helps to minimize thermally induced damage. The Ion Implanter is designed to create a uniform distribution of implanted material through an efficient operation procedure. It also features advanced magnetic lens technology for enhanced beam direction accuracy. Beam control is managed by a Total Radiation Defect Control (TRD) software. This software is designed to allow the implanter tool to quickly adapt to changing substrate composition, patterns, and depths. The Ion Implment Monitor is capable of real-time monitoring of implant parameters and substrates in order to ensure the asset delivers reliable, safe, and repeatable implants. The monitor uses advanced detectors to measure a wide range of parameters, including doping levels, anisotropy, thermal influence, and thickness. This helps in the analysis of implant results and assists in assuring lithography accuracy. NV-GSD-A-80 is a reliable and highly efficient ion implanter and monitor model. It offers a range of features and technologies such as precision implant technology, magnetic lenses, TRD software, and advanced monitoring capabilities, which enable it to efficiently produce high-performance implants at a high accuracy and repeatability level. As a result, it is an ideal choice for semiconductor fabrication applications.