Used NISSIN Exceed 2000 #9179597 for sale

NISSIN Exceed 2000 is an advanced ion implanter and monitor used to conduct efficient doping operations for semiconductor fabrications. This ion equipment provides a wide range of current and energy outputs with precise control over parameters such as beam direction, beam energy, and beam size, allowing for highly tailored ion implantation profiles. Exceed 2000 performs high quality doping operations thanks to its intelligent sequential profile adjustment. It contains a large set of profiling tools that can be used to define patterns for implantation on the wafer surface. The system also offers automatic beam spot adjustment to provide superior wafer implantation accuracy. NISSIN Exceed 2000 is powered by a reliable, low-noise electron source that is able to maintain a stable, precise beam of ions. It features user-friendly, programmable controls and high-performance, computer monitoring that allow for accurate tracking of the ion implantation process. The unit also includes a dual energy function that provides independent control over both implantation and annealing energy ranges and speeds up the process of creating the desired doping profiles. Exceed 2000 machine integrates a variety of additional features and functions to further improve the doping operation. It contains an intelligent beaming and post-implantation tool scan that ensures optimal uniformity in the implantation process. The asset also includes a smart wafer mapping command that allows for quick wafer pattern design. NISSIN Exceed 2000 is engineered to provide users with maximum operational efficiency, precision, and control over the doping process. It is equipped with a powerful, intuitive graphical user interface for streamlined operation, making it easy and convenient to use. Its advanced features and reliability make it suitable for use in a wide variety of semiconductor fabrication applications.