Used VARIAN 350DE #69341 for sale

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ID: 69341
Mid current ion implanter, 4"-6" Set for Phosphine, BF3, and Arsine Standard configuration 1985 vintage.
VARIAN 350DE is a fully automated ion implanter and monitor that is used extensively for high precision ion implantation processes. Its superior accuracy and speed make it the ideal choice for a variety of applications, from microelectronic devices to materials research and development. 350DE is capable of achieving a very high precision with its advanced scan control and automation features. The variable implant parameters can be precisely adjusted to produce the desired end result quickly and efficiently. The system allows for an adjustable ion beam spot size, allowing different layers and functionality across wafers without having to switch to a different machine. VARIAN 350DE is equipped with a high accuracy ion source and monitor. It utilizes a unique digital beam profile controllable ion source that is highly accurate, maintaining a stable beam profile even over long implant times. This feature ensures that implanted ion doses remain consistently within targeted ranges and that implant uniformity across the wafer is increased. 350DE offers an adjustable range of implant parameters including beam current, voltage, beam shape, dwell time and depth of the implanted ions. The system can handle up to 5,000 ions per second, so it is well suited for high throughput applications. It also has a wide range of external control capabilities, allowing for fast, efficient operation across multiple implant runs. VARIAN 350DE is extremely reliable and maintenance free, requiring simple and infrequent calibrations. It comes with comprehensive documentation and special software for programming, so users can easily control and adjust the parameters of their implantation process for optimal performance. Overall, 350DE is a powerful, versatile and highly accurate ion implanter and monitor, that provides precision and reliability for a variety of implant applications. Its high speed, reliable accuracy and wide range of external control capabilities make it an ideal choice for researchers and engineers looking to achieve the best implantation results.
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