Used VARIAN E220HP #9237387 for sale
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ID: 9237387
Wafer Size: 8"
Vintage: 1995
Ion implanter, 8"
Main components:
End station module
Terminal module
Services module
PC & Monitor
Accel column
Accel stack
Accel PSU & tray
Accel suppession PSU
Decel PSU
Enclosure
Signal tower & HV lights
Signal tower controller box
Exhaust leakage box
No remote PC & monitor
End station services module:
Right arm servo controller
Vacuum gauge controller
Scanning faraday controller
Platen tilt servo controller
Uniformity controller
Liner motor servo controller
Orienter controller
Left elevator controller
Right elevator controller
E-Chuck clamp PSU
Dose integrator controller
D.I. Temp monitor
Vertical lift orienter
No electric flood controller
No UPS
Terminal PSU & Assy:
Set-up faraday cup assy
Extraction manipulator
Motion controller
Swing out arm decel
Relay arm decel assy
Set-up mirror assy
Neutral dump assy
Anal beam dump assy
Source mag assy
Anal mag assy
Quad mag assy
Lens mag assy
Scan controller
Scan generator: 20Kv
Set-up faraday pre-amp
Vacuum gauge controller
Scan assy
Analyzer PSU
Extraction PSU
Lens PSU
Suppression PSU
Mirror PSU: 30 Kv
Source mag PSU
No 30 Kv scan generator
No Mirror 60 Kv PSU
Source head & gas cabinet:
Source head
Arc PSU
Filament PSU
No vaporizer
No vaporizer PSU
Gas module:
(2) AsH3: SDS
PH3: SDS
(3) BF3: SDS
(4) Ar: Diss, CGA 580
Vacuum system:
EDWARDS / SEIKO SEIKI STP-1000C Source turbo pump
EDWARDS / SEIKO SEIKI STP-300 Resolve turbo pump
EDWARDS / SEIKO SEIKI STP-1000 End station cryo pump
CTI 250F Load / R cryo pump
CTI 4F Load / L cryo pump
CTI 4F Beam-line turbo pump
1995 vintage.
VARIAN E220HP is an ion implanter and monitor designed for high precision implanting and process control applications. It offers excellent performance in several areas, including high dose rate, accurate beam parameters, source position accuracy, and better control of beam uniformity. VARIAN E220 HP is designed to provide consitently high dose rates of up to 80μA/cm2. The Ion Source has an adjustable spot size that can be changed between 1.2 and 3.2mm. The uniformity of the beam provides accurate beam parameters that increase accuracy and reliability of results. A highly sensitive position feedback equipment is included for precise positioning of beams and intensity profiles. The monitor includes an automated two-step monitor that measures and controls both beam uniformity and profile parameters. This monitor can be adjusted to meet different deposition requirements and also maintains beam repeatability to ±0.5%. It also enables the user to preset profiles and its advanced control settings can improve particle concentration and uniformity. E 220 HP also has a process control system which can be safely calibrated with the improvement of technology. This unit constantly captures and stores process data for each implant operation which helps ensure accuracy and traceability. This data can be accessed to investigate process discrepancies or to provide critical process control documentation. Aside from its advanced control features, E220HP also has multiple safety measures installed. It has a wide range of alarm functions such as pump, fan, or energy monitor alarms which ensure optimal protection for operators and the surrounding environment. In summary, E220 HP is an advanced and reliable ion implanter and monitor that offers the user exceptional performance. Its consistently high dose rates, accurate beam parameters, precise positioning of beams, and advanced process control machine are all key features that make VARIAN E 220 HP a great choice for implanting and process control applications.
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