Used VARIAN E500 #9229634 for sale

VARIAN E500 is a versatile ion implanter and monitor used in the semiconductor industry that provides high precision, speed and accuracy. It is capable of implanting ions into a wide variety of substrates with energies ranging from 0.1 MeV to 90 MeV. VARIAN E 500 utilizes an advanced beam scanning equipment, along with intelligent optics technology to provide enhanced control of dose, uniformity, and dose rate. This technology also enables the use of ion species such as boron, phosphorus, arsenic, and: others. E-500 system is easy to use and provides a highly reliable platform for key processes in semiconductor device manufacture such as epitaxial silicon, substrate activation, silicidation, and other material implantation applications such as surface passivation and doping. E500 ion implanter and monitor is designed to operate efficiently in a large variety of vacuum systems. Its modular design enables the user to select a vacuum unit containing the elements for the process of choice. This ensures consistent process control and accuracy. E 500 machine also supports intelligent vacuum technology to provide continuous monitoring of the chamber conditions and efficient driving capabilities that reach ultra-high pressures. VARIAN E-500 includes a sophisticated management and control tool which provides improved yields, greater reliability and more efficient process control. VARIAN E500 features a user friendly interface, allowing users to create and modify process recipes quickly and accurately. The asset also includes a versatile graphical user interface that allows users to quickly visualize and edit implant recipes. This model also allows users to track and analyze implant results with real-time data. In addition to its wide range of process capabilities, VARIAN E 500 includes several built-in diagnostic tools for quickly troubleshooting any issues that may arise. These diagnostic tools are designed to quickly identify issues and faults with the equipment and enable quicker rectification or corrective action. Overall, E-500 is a reliable and robust ion implanter and monitor that provides enhanced process capabilities for implanting ions and other materials onto a variety of substrates. The system is designed for easy operation, providing reliable and accurate performance, along with intelligent optical technology for precise dose control and uniformity. E500 also supports intelligent monitoring and control capabilities, enabling users to easily create and modify implant recipes, monitor implant performance in real-time, and troubleshoot any potential issues quickly and efficiently.