Used FEI Expida 1255 #9233851 for sale
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ID: 9233851
Wafer Size: 12"
Vintage: 2006
Dual beam FIB system, 12"
(2) KEITHLEY 6485 Pico ammeters
RARITAN Compuswitch
Monitor
Keyboard
Control knob
Mouse
Joystick
System computer:
Floppy Disk Drive (FDD)
CD Rom drive
Hard Disk Drive (HDD)
MITSUBISHI Printer missing
LBO-51MA Display unit
ROSH Compliant: SCHOTT DCR III
Canopus box
(3) GIS II Controllers
CIV Controller
(2) GIS Controllers
Controller rack:
Delta power supply lens
AVA Controller
MBCA Controller card cadge:
SCRD, MRSF2, LNSA, MDLN/I, DLCB/SN, QDCR/SN, REF/SN
A Controller card cadge:
SCRD, MRSF1, LNSA, MDLN/I, REF/U, DLCB/SN, QDCR/SN, QDCR/SN, DSC
MBB Controller card cadge:
GRID FPS, DCN/SD, LHT N,VDRC, Gain FPS, HTT IO, BIAS FPS, UDTB/N, UDTB/N, UDTB/N, DDCB, DRV
MBD Controller card cadge:
HRDS, HVGD, SDB, MCCB DBTR, HVG/D, CTBI, PLCB2, EBD
MBS Controller card cadge:
EBR, CAN/CCB, PLCB, PVG8I, PLCB, POWER, PRA100M3
IGPL
IGPU
SSIP Type: PE3188/30
Controller 1:
MCCB, HRDS, MDAC, MDAC, MDAC, MDAC, REF/U, MIB, DSC, CTB2, HVG/D, MOB
AVA Controller
Charge neutralization controller
Main power supply
Spicer consulting field cancelling system
STP (STP-301/451)
3COM HUB
H.V Power supply
IGPL
IEC3
Delta power supply IEC
PD-7 Driver box
Power supply: SM7020D (Delta power supply stage)
Main body:
Column unit: IGPU, IGPL
Long life LMIS
Gas injection system
Load lock
Controller card cadge
STP451C Turbo pump
AC Pump power supply
Pump I/F Module
2006 vintage.
FEI Expida 1255 is an Ion Milling equipment that is used in a variety of laboratories and industrial workplaces for surface processing applications. Utilizing an advanced ion beam source and improved electrode design, Expida 1255 provides impeccable etching, milling, and patterning capabilities with its high precision delivery of ion beams. The ion source in FEI Expida 1255 is a Scanning Ion Beam Source that is capable of delivering a beam current of up to 20 milliamps. This beam is adjustable in both energy and current, allowing for more precise control and more defined etching, milling, and patterning. A new, improved electrode design also allows for better control of ion beam deflection, resulting in higher surface processing quality. Additionally, the ion milling source is paired with a Digital Scan Magnifier that allows for increased precision of ion beam delivery, further enhancing the quality of surface processing operations. Expida 1255 is capable of performing a wide range of surface processing operations such as dry and wet etching, heavy milling of hard and soft materials, creating negative and positive relief features, precision etching of patterned surfaces, enhanced feature resolution, and high-precision conformal coatings. Utilizing a multi-axis, 3-dimensional, micro-positioning system, FEI Expida 1255 allows for precise control of depth and features depth down to 1 micron. Expida 1255 also features an adjustable vacuum environment to ensure clean and contamination-free processing. Additionally, the unit utilizes a TFT operator interface panel that allows for easy and intuitive operation, and can be remotely controlled for added convenience. The machine also features an active cooling tool that prevents the ion source from overheating, enabling it to perform extended sessions without any downtime. Overall, FEI Expida 1255 is the ideal asset for conducting any type of surface processing operation thanks to its advanced ion source, adjustable vacuum environment, and intuitive control model. With its high precision and reliable performance, laboratories and industrial organizations can take advantage of the excellent etching, milling, and patterning capabilities of Expida 1255 for a variety of applications.
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