Used FEI / MICRION 2500 #9204443 for sale

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Manufacturer
FEI / MICRION
Model
2500
ID: 9204443
Focused Ion Beam (FIB) system Ion beam data: Ga, 50 kV, 5 nm, 20 nA Specimen stage: 75 mm x 75 mm, 5 axis Detector: MCP Data recording: Digital output Video printer Gas: Tungsten deposition Tmcts insulator deposition XeF2 Insulator etch Chlorine metal etch Vacuum system: Turbo with mechanical RP Other component: CAD NAV.
FEI / MICRION 2500 is an advanced ion milling equipment designed for precise and versatile milling applications. It is ideal for use in nanotechnology, material science, and semiconductor processing. FEI 2500 utilizes a high-power gallium ion source, which produces an ion beam to the specimen stage. This produces ultra-fine ion-beam milling of materials as small as 0.2 nanometers. Additionally, it can be used to create exceptionally flat surfaces for microscopy imaging and patterning. The system is an automated XYZ stage, with the ability to perform multiple operations on a single specimen. It can also perform tandem milling, allowing multiple ion-beam etching passes on different types of materials. The unit features high-precision optics and piezo transport technology, providing for precise control of the beam focusing and specimen movement. Its advanced software also allows for automated optimization of the ions beam parameters and fine control of the beam tilt towards the sample. The machine includes an advanced vacuum environment that ensures repeatable, clean milling results. Its intelligent vacuum control keeps the machining process clean, reducing redeposition of material on the specimen. The base pressure of the tool reaches a low 1×10-8Torr range. The asset provides a very high level of control, allowing users to finely adjust the beam energy, beam current, scan speed, beam angle, and scan pitch. This provides a precise tool with exceptional repeatability performance, allowing for intricate and delicate material processing with minimal material damage. MICRION 2500 is a powerful and versatile ion milling model, capable of processing delicate and difficult-to-machine materials with great accuracy and precision. Its adjustable scanning parameters, coupled with a powerful ion source and automated vacuum control make it a reliable tool for nanoscale material processing.
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