Used PHILIPS / FEI Strata 400 #9172655 for sale

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Manufacturer
PHILIPS / FEI
Model
Strata 400
ID: 9172655
Dual ion beam system Electron source: Schottky Thermal field emitter Ion source: Gallium liquid metal Image resolution: <0.8 nm achievable SEM-STEM Mode Maximum sample size: 75 mm diameter Loadlock compatible PC Power rack Desk Does not include EDS and chiller Sample types: Wafer pieces Packaged parts TEM Half-grids Flip stage: Removable row holder up to (6) TEM Grids Total tilt range: >150°C External load base: Loading / Unloading grids from row holder In-situ section extraction system SEM-STEM Detector: Multi-region: Bright field Dark field (12) High-angle dark field segments Key options: Gas chemistry: Range of proprietary deposition and etch chemistries (TEOS, W, Pt) Hardware: OMNIPROBE 200 Beam voltage: SEM: 200 V - 30 kV FIB: 2 kV - 30 kV User interface: GUI with integrated SEM, FIB, GIS Imaging and patterning Simultaneous patterning and imaging mode Operating system: Windows 2000.
PHILIPS / FEI Strata 400 Ion Milling Equipment is an advanced ion milling system designed for precision etching and cleaning of surfaces. It is an ion milling technique used to achieve extremely fine surface finish and high degree of surface control for surfaces. This unit uses a powerful broad spectrum of energetic ions to simultaneously mill the surface of both non-metallic and metallic materials to obtain a uniform topography. The machine is a tightly integrated tool composed of two main components: the ion source and the sputter chamber. The ion source is a high voltage, high current arc ion source, with two main ion energy ranges and two different triggering methods (pulsed and continuous). The source can generate ions at a predetermined energy range, providing broad beam coverage. The sputter chamber is an enclosed chamber that houses a plasma reaction chamber on one side and an electrostatic beam-steering assembly on the other. The plasma reaction chamber is a vacuum chamber filled with an inert gas, allowing the ionized particles to freely move while simultaneously helping to protect the sample from oxidation. The beam-steering assembly helps to selectively direct the ions to a particular area where etching or cleaning is to be performed. Overall, FEI Strata 400 is designed to provide users with a precise and consistent ion milling process for conducting high resolution etching and cleaning applications. Utilizing the large range of ion energies and the selective beam-steering assembly, users can achieve uniform finish and uniform surface texture for their sample surface with extremely high levels of accuracy. Moreover, since the process is anisotropic and non-selective, no special patterning techniques or post-processing techniques are required.
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