Used PHILIPS / FEI Strata 400 #9172655 for sale
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ID: 9172655
Dual ion beam system
Electron source: Schottky Thermal field emitter
Ion source: Gallium liquid metal
Image resolution: <0.8 nm achievable SEM-STEM Mode
Maximum sample size: 75 mm diameter
Loadlock compatible
PC
Power rack
Desk
Does not include EDS and chiller
Sample types:
Wafer pieces
Packaged parts
TEM Half-grids
Flip stage:
Removable row holder up to (6) TEM Grids
Total tilt range: >150°C
External load base: Loading / Unloading grids from row holder
In-situ section extraction system
SEM-STEM Detector:
Multi-region:
Bright field
Dark field
(12) High-angle dark field segments
Key options:
Gas chemistry: Range of proprietary deposition and etch chemistries (TEOS, W, Pt)
Hardware: OMNIPROBE 200
Beam voltage:
SEM: 200 V - 30 kV
FIB: 2 kV - 30 kV
User interface:
GUI with integrated SEM, FIB, GIS
Imaging and patterning
Simultaneous patterning and imaging mode
Operating system: Windows 2000.
PHILIPS / FEI Strata 400 Ion Milling Equipment is an advanced ion milling system designed for precision etching and cleaning of surfaces. It is an ion milling technique used to achieve extremely fine surface finish and high degree of surface control for surfaces. This unit uses a powerful broad spectrum of energetic ions to simultaneously mill the surface of both non-metallic and metallic materials to obtain a uniform topography. The machine is a tightly integrated tool composed of two main components: the ion source and the sputter chamber. The ion source is a high voltage, high current arc ion source, with two main ion energy ranges and two different triggering methods (pulsed and continuous). The source can generate ions at a predetermined energy range, providing broad beam coverage. The sputter chamber is an enclosed chamber that houses a plasma reaction chamber on one side and an electrostatic beam-steering assembly on the other. The plasma reaction chamber is a vacuum chamber filled with an inert gas, allowing the ionized particles to freely move while simultaneously helping to protect the sample from oxidation. The beam-steering assembly helps to selectively direct the ions to a particular area where etching or cleaning is to be performed. Overall, FEI Strata 400 is designed to provide users with a precise and consistent ion milling process for conducting high resolution etching and cleaning applications. Utilizing the large range of ion energies and the selective beam-steering assembly, users can achieve uniform finish and uniform surface texture for their sample surface with extremely high levels of accuracy. Moreover, since the process is anisotropic and non-selective, no special patterning techniques or post-processing techniques are required.
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