Used VEECO Nexus IBE 350i #9186537 for sale

VEECO Nexus IBE 350i is an Ion Beam Etch (IBE) equipment manufactured by VEECO Instruments Inc. The system utilizes a unique ion milling process to pattern surfaces on substrates in the nanometer range. The IBE is a specialized etcher that uses energetic ions to remove material from the substrate surface. This process allows for the removal of materials such as silicon, gallium arsenide, polymers, metals, and dielectric materials with excellent etch selectivity and high resolution features. The unit operates by first bombarding the surface of the material with an energetic beam of ions. These ions penetrate the surface and cause chemical bonds to break, releasing material from the substrate. This process is known as sputtering and accounts for the majority of the etching process. The Nexus 350i utilizes a special dual beam machine that allows for both sputtering and etching at the same time. This allows for faster etching time and improved process control. In addition to the dual beam tool, the Nexus 350i is also capable of delivering high levels of ion current with its patented Ion Beam Diode Technology. This technology is able to generate extremely high ion current densities of several watts/cm2 or higher. This high level of current is combined with excellent accuracy, making it possible to etch features with a resolution of less than 0.2nm. The Nexus 350i also features two main chambers for optimal application versatility. The main chamber is used for etching and the secondary chamber is used for sputtering. Both chambers are equipped with two sources for beam control and patterning. The asset is now integrated with an advanced automation control model that allows for easy setup and process parameter adjustment. In conclusion, Nexus IBE 350i is an advanced ion milling etcher that is capable of producing high levels of accuracy and resolution with fast etching times. The dual beam equipment and advanced IBE technology gives the system optimal performance and precision, allowing it to be used for a wide variety of etching applications.