Used FILMETRICS F20 #293621612 for sale

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ID: 293621612
Thin film analyzer Wavelength range: 380-1050 nm Film thickness measurement range:15nm - 70 μm.
FILMETRICS F20 is a wafer testing and metrology equipment designed to provide high-accuracy, non-destructive measurement of thin-film thickness and optical constants across a wide range of materials and emission angles. The system utilizes a set of advanced algorithms to enable accurate, repeatable measurements in seconds, allowing for quick and easy characterization of device layers and parameters which have direct implications on device performance. FILMETRICS F 20 unit is comprised of two main components: a measurement head and a control console. The measurement head contains a broad light source which is used to measure the optical properties of the wafer sample across a range of emission angles. The control console provides a user-friendly interface to control sample position and selection, as well as data output options. A range of accessories is available for F20 machine to further facilitate sample measurement, including lenses, prisms, filters, and other optical components. F 20 tool incorporates a patented Spectral Ellipsometry Detection (SED) asset that uses optical interference to accurately measure the thickness and optical constants of the sample, as well as surface roughness. This enables precise and repeatable measurements in seconds while eliminating the need for sample destruction and sample handling. The SED model also enables precise detection and tracking of thin film metrology and other materials parameters. FILMETRICS F20 equipment provides a range of data analysis options to help users accurately calculate the required parameters and visualize the results. The system can further provide data outputs in popular formats, including ASCII, CDF, and binary, for easy data sharing and analysis. FILMETRICS F 20 unit is capable of providing precise, repeatable measurements for a range of materials, including semiconductors, metals, and dielectric layers. The machine provides an ideal platform for researchers looking to accurately and quickly characterize thin layers and surface effects for a variety of devices and applications.
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