Used CYMER ELS 6400 #9224613 for sale

CYMER ELS 6400 is a high-energy excimer laser system designed for use in semiconductor and microelectronic fabrication applications. It produces ultraviolet light in a single wavelength, usually 193nm. The laser system consists of a resonator, which is an evacuated chamber containing a laser medium and an output coupler mirror. The laser medium is typically a mixture of a noble gas and a halogen compound, such as xenon chloride (XeCl). This mixture is excited by a series of electrical pulses, which causes the molecules to release photons. The photons are amplified through stimulated emission and enter the resonator. Inside the resonator, the photons are bounced back and forth between two mirrors, or an output coupler and a total reflector. The photons eventually reach the output coupler mirror, which allows them to exit the lens. Once out of the resonator, the photons are focused into a single beam. The laser is capable of producing pulses of high energy, typically up to 300 joules with pulse widths of 7 to 10 nanoseconds. Some versions of CYMER ELS-6400 can also produce multiple pulses concurrently for rapid parallel processing. The beam produced by ELS 6400 is highly coherent and is used for lithography, ablation, and other laser processing applications. It is also used in medical and cosmetic applications, such as skin resurfacing and eye surgery. ELS-6400 is designed to be energy efficient, emitting fewer emissions than traditional excimer lasers. Its low maintenance and reliable performance make it a popular choice for lithography and ablation applications in many industries.