Used CANON PLA 501 FA #9030659 for sale

CANON PLA 501 FA mask aligner is a highly accurate and cost-effective photolithography equipment designed for advanced packaging and chip mounting applications. The system features a large field-of-view (FOV) of 310 × 310 mm and a high-resolution 0.125 μm stepper lens to ensure accurate placement and alignment of substrates. The unit also has two independent substrate stages with 8" and 12" sleds to accommodate substrates up to 24" in diameter, allowing for quick and easy mask loading/unloading, substrate motion, and focus adjustment. The machine's advanced opto-mechanical design and high-performance opto-electronics result in fast exposure speeds and precise alignment for consistently high yields of advanced packages or large format chips. For patterning accuracy, CANON PLA-501FA mask aligner is equipped with an automatic wafer alignment (AWA) tool, incorporating an advanced algorithm that accounts for variations in shape or surface irregularities of the mask/substrate material. This ensures accurate and precise alignment of the mask during exposure. Additionally, the asset's easy-to-use graphical user interface (GUI) allows users to quickly and easily adjust the lithography parameters to optimize exposure times and to compensate for any model errors. PLA 501FA also features an optional laser interferometer that can improve both positioning accuracy and exposure time, ensuring the highest quality results. Other features of CANON PLA 501FA mask aligner include a simplified maintenance procedure, cleaning timer, and adjustable exposure dose control. The maintenance procedure features automatic shutoff and restart, ensuring that the equipment is always in perfect condition. The cleaning timer also can be set to take effect at any preferred regular interval, so that the system always remains clean and free of any dirt or residue. The adjustable exposure dose control allows for fine-tuning of the exposure time, resulting in quality images that are highly reproducible. PLA 501 FA mask aligner is a valuable tool that can be used to quickly and accurately produce high-resolution images for advanced package and chip mounting applications. Its large FOV, high-resolution optics, advanced patterning accuracy, and ease-of-use make it an ideal choice for many different semiconductor/chip designs.