Used CANON PLA 501 #293621683 for sale

CANON PLA 501 is a highly sophisticated mask aligner that is used in semiconductor fabrication. It has been extensively used in the semiconductor industry for the high-precision alignment of photolithography mask onto a wafer. The equipment is suitable for the production of ICs requiring precise stencil printing, fine-line lithography, and high resolution patterning. CANON PLA-501 enables high-quality fabrication of semiconductor devices, providing high levels of precision and repeatability. It is designed to ensure optimal accuracy and reliability in the alignment of lithographic masks and thin-film components. The system features auto-alignment technology, which allows for precise and repeatable alignment of photolithography mask plates and wafers. The unit is equipped with an InGaAs monitor which detect the edges of the mask plates with a maximum of 107nm resolution. This sensor can detect the edges of photoresist patterns even in the most intricate designs. Furthermore, the machine is designed to guarantee a high resolution, with the maximum alignment accuracy being 5nm. The tool also contains a Z-stage mechanism, which ensures that the thin-film layers of the mask plate and the wafer being aligned are aligned perfectly parallel, providing for a more accurate alignment process. PLA 501 is also capable of patterning ultra-high resolution structures. It is equipped with a stepping motor that provides for a continuous emission of laser light, allowing for fine structures to be formed and patterned on the mask plates. This asset is compatible with a variety of mask types, and it can handle up to 150 mask plates. Furthermore, the model allows for up to 200,000 alignment patterns to be created, providing an efficient and reliable process. Overall, PLA-501 is widely used in semiconductor manufacturing and provides a reliable and efficient process. The mask aligner is highly advanced and offers precise and repeatable alignment of photolithography mask plates and wafers. This equipment is also capable of patterning ultra-high resolution structures, providing flexibility and accuracy to semiconductor components.