Used CANON PLA 600 FA #151689 for sale

CANON PLA 600 FA is a mask aligner designed for precision photolithography at the micro- and nano-scale levels. It is a highly advanced, computer-controlled wafer stepper with a set of features that make it suitable for a wide range of applications. The mask aligner has a stage that features a xenon lamp, a scanner, and a 6" round glass plates. The stage is designed to handle a variety of substrates from 200mm wafers to petri dishes. The scanner and lamp are connected to an automated precision x-y drive for precise positioning. The stage is equipped with a focal distance of 5-400 mm and a non-manual focus override. The focal distance and focus override together allow for x-y adjustment of the optics to achieve exact angle placement of the substrate. CANON PLA-600FA can accurately position and align multiple masks at the same time on a single wafer. The masks are placed in the mask reader, which can be set to a single or dual mode. The reader, which is driven by a micro-stepper motor, reads and stores the mask orientation, allowing the operator to accurately place the masks on the wafer. The system is also equipped with memory storage, allowing the operator to save up to three mask orientation settings for future use. The mask aligner's most advanced feature is its backside alignment, which allows for precise control of the multi-mask orientation on printed substrates. The backside alignment feature also allows for remote control of the wafer stepper, eliminating the need for manual intervention. PLA 600FA also offers integrated software that enables the operator to track and maintain the alignment of the multiple masks with precision. The software also provides multi-level control options that allow for precise fine tuning of the mask alignment. Overall, CANON PLA 600FA is an advanced, highly flexible mask aligner that offers exceptional accuracy and control for applications at the micro- and nano-scale. It is a powerful tool for printing lithography that offers users a range of features to meet their specific requirements.