Used KARL SUSS / MICROTEC MA 24 #60054 for sale

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ID: 60054
Wafer Size: 4"
Aligner, 4" Alignment accuracy (between upper and lower side of the wafer): <2 Microns Alignment table rotation: <2° Double side exposure Cassette to cassette handling Bright field and dark field illumination Diffraction reducing optical systems 350W HBO Lamps.
KARL SUSS / MICROTEC MA 24 is an automated mask aligner designed for various photolithography applications. The machine is designed to be highly precise, capable of achieving resolutions of down to 0.25 µm. It is equipped with an optical camera, which is used to assess the alignment between the mask and the substrate with a high degree of accuracy. MICROTEC MA 24 includes a number of features for a wide range of applications, such as stepper alignment control and manual alignment correction. To begin the alignment process, KARL SUSS MA 24 receives a substrate which is placed in the holder of the machine. The substrate can be composed of a variety of materials such as silicon, silica, and glass, and the size of theholder is designed to adapt to various substrate sizes. After the substrate is loaded, the mask is placed in the mask carrier and then inserted into the mask positioning stage in perfect alignment to the substrate. MA 24 then runs a brief mask alignment process before beginning the reticle transfer process. The reticle transfer process requires KARL SUSS / MICROTEC MA 24 to use a variety of advanced optics including LED, arc lamps, Bessel beams, and laser projection system to accurately transfer the pattern of the mask onto the substrate. These optics, combined with the stepper alignment control, allow for very precise placement of the reticle onto the substrate. MICROTEC MA 24 also includes a manual alignment correction feature that allows the user to alter the alignment of the mask on the substrate for more accurate placement of the reticle. After the reticle transfer process is completed, KARL SUSS MA 24 proceeds to the curing stage, where the transferred pattern is permanentely transferred onto the substrate by curing the resist material. MA 24 can be outfitted with either a UV curing lamp or hotplate, depending on the requirements for the current application. Finally, after the pattern is cured, the machine can be set to align another mask onto the same substrate by repeating the alignment process without the need to remove the substrate. Overall, KARL SUSS / MICROTEC MA 24 is a highly precise mask aligner designed specifically for various photolithography applications. Its advanced optics and alignment features allow for highly accurate reticle placement onto the substrate and its curing features ensure that the pattern is permanently affixed to the substrate. The machine's ability to reload the same substrate used in the previous alignment save processing time and increase efficiency.
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