Used KARL SUSS / MICROTEC MA 6 #9173487 for sale

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KARL SUSS / MICROTEC MA 6
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ID: 9173487
Mask aligner Lamp power supply CIC00/1000 for constant power and constant intensity Exposure optics: UV400 Exposure timer M204 Splitfield microscope with photo tubes Includes: (10) Occulars Set of objectives OLYMPUS MPlan FL N 10x/0,30 Mask holder bottom loading, 5" Wafer diameter, 4" Chuck specification for substrates / 4" wafer for soft contact.
KARL SUSS / MICROTEC MA 6 is a mask aligner, also known as a stepper. It is primarily used in photolithography processes, where it is employed to accurately deposit patterns of radiation-sensitive material onto a substrate. MICROTEC MA6 stepper consists of a base, a base module, a vacuum chuck and a pattern head. The base of KARL SUSS MA-6 houses all the components within the machine. It holds the x, y and z axes, and the plate control cards, as well as the control cabinet, vision equipment, and interferometer for managing the system. The base module contains a lift table that is used to transport substrates between the vacuum chuck and the wafery rings placed over the external floor. The vacuum chuck is composed of multiple columns onto which chuck plates can be affixed. These contain mechanical pins and sensors for accurately securing substrates for processing or alignment. MA-6 also contains a pattern head which is essentially a robot arm with a laser radiation source. The laser beams are used to deposit patterns onto the substrates, which are written onto the material via a specialized software program. KARL SUSS / MICROTEC MA6 has a highly precise fine-focusing step allowance, which ensures that the pattern is accurately printed on the substrate according to the design specifications. It also boasts several advanced features including micron-level alignment between the pattern head and the substrate, a vision unit with a built-in display monitor and imaging capabilities, a rotation plate which allows the substrate to be rotated and a state-of-the-art illumination machine. With MA6, multiple substrates can be processed in one run and an array of substrates can be exposed simultaneously through the use of multiple pattern heads. MICROTEC MA 6 is typically used in photolithography processes where it is employed to accurately deposit patterns of radiation-sensitive material onto a substrate. It is suitable for a wide range of applications such as semiconductor device manufacturing, medical device technology, flexible electronics, and microelectronic product manufacturing. Its breakthrough technological features and ease of use make it a reliable and economical choice for photolithography facilities.
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