Used KARL SUSS / MICROTEC MJB-3 #293586572 for sale

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ID: 293586572
Vintage: 2000
Mask aligner 2000 vintage.
KARL SUSS / MICROTEC MJB-3 is an automated mask aligner, which is widely used for lithography processes in the semiconductor and microelectronic industries. The device is equipped with an optical and a mechanical equipment, allowing for precise mask alignment and overlay registration and ensures a high level of accuracy and speed for batch processing. The aligner combines an optical system with a motorized motor-driven x-y stage to position the mask in relation to the wafer. The optical alignment unit monitors and detect misalignment of wafer and mask during the alignment procedure and can automatically shift the mask to remove any misalignment. MICROTEC MJB3 is designed to have a repeatability of 0.5 μm or better. KARL SUSS MJB 3 features an automated loading machine, which allows a single operator to load multiple masks in a semi-automated manner. The masks can be loaded sequentially or in parallel. The aligner can also dynamically improve the accuracy of the alignment procedure by using dual lasers and measuring the misalignment caused by substrate thickness variation or other factors during the loading process. MJB 3 feature automated mask inspection, allowing defects to be detected before the masks are copied onto the wafer. KARL SUSS MJB-3 offers a choice of either optical or non-optical exposure sources, allowing for flexibility in the exposure process. It also provides for different lens options for customized exposure requirements. The device is capable of operating with many substrates such as quartz, single-crystal silicon, and photoresists. KARL SUSS / MICROTEC MJB 3 comes with software for controlling the alignment operations and exposure settings. The software includes manual alignment and a simulation mode for estimating the overlaps between the mask and the substrate. The software also allows for batch processing and image-capturing of wafer alignment results for traceability records. MICROTEC MJB 3 is designed to be highly compatible with other semiconductor fabrication machines, such as laser scanners and etchers. This configuration allows multiple wafers to be processed simultaneously. The device also offers capabilities such as extending exposure time or selectable z-coordinates on each exposure, which can be beneficial in optimizing the exposure process. Overall, KARL SUSS MJB 3 possesses a range of features that make it an ideal choice for lithography processes in the semiconductor and microelectronic industries. It is designed to offer a high level of accuracy, repeatability, and speed, as well as flexibility in its exposure processes. The device is also capable of handling multiple substrates and is highly compatible with other fabrication machines. MJB 3 is an excellent choice for a mask aligner for precision and cost-effective lithography.
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