Used ETEC Mebes 4500-5500 #9081928 for sale

ETEC Mebes 4500-5500 is a mask generation and production equipment designed for high-volume, high-quality photomask fabrication processes. The system makes use of both electron beam and optical imaging technology to create high-resolution photomasks. The heart of the unit is its high-resolution electron beam writing (EBW) machine, which utilizes an automated E-Beam column to generate the photomasks used in device manufacturing. The E-Beam tool features a maximum scan speed of up to 10 million points/second, using a beamsize of 6 to 30 nm. This allows for the creation of extremely precise photomasks with the ability to increase resolution and reduce particle contamination. Furthermore, the asset comes with an automated Vamis DLP (Digital Light Processing) optical exposure unit, and supports both standard lithography resolution levels (5µm min) as well as multiple enhanced resolutions. In addition to its high resolution capabilities, Mebes 4500-5500 also has a number of features designed for improved speed and productivity. These include an advanced robotic substrate handling model, an adjustable laser-guided positioning equipment, and a fast photomask inspection system with automated inspection and manual scanning capability. Overall, ETEC Mebes 4500-5500 is an extremely advanced and reliable mask generation and production unit that offers precision, speed, and accuracy. Its features allow it to create high-quality photomasks that meet tight specifications with minimal particle contamination. This makes it an ideal choice for high-volume applications, and is a cost-effective solution for upgrading lithography capabilities in manufacturing processes.